Photoresist stripping solution "Unrust RW-C"
Compatible with immersion and spray methods! Introducing a mixture of caustic alkali and high-boiling solvents.
"Unrust RW-C" is a photoresist stripping solution that offers strong peeling and cleaning properties for resins, compatible with both immersion and spray methods. It is suitable for the regeneration and cleaning of glass substrates and for the stripping of resin resist. It is a mixture of caustic alkali and high-boiling solvents. 【Processing Conditions】 ■ Concentration: Undiluted treatment ■ Temperature: 50–70°C ■ Time: Approximately 5 minutes *For more details, please refer to the PDF document or feel free to contact us.
- Company:三若純薬研究所
- Price:Other