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Vacuum Hotplate Chamber - List of Manufacturers, Suppliers, Companies and Products

Vacuum Hotplate Chamber Product List

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Vacuum Hot Plate Chamber "PH-224 Type"

Vacuum Hot Plate Chamber "PH-224 Type"

It uses a thin heater as the heating source, supporting high-speed temperature profile processes.

The "PH-224 type" vacuum hot plate chamber is a small batch furnace type, ideal for small quantities and research and development. It uses a thin heater as the heating source, enabling it to accommodate high-speed temperature profile processes. The temperature controller, being a dedicated type, can obtain the necessary data for process verification (analog output). 【Features】 - The workpiece condition is visible through the observation window. - Air cooling allows for a maximum temperature of 400℃. For more details, please contact us or download the catalog.

  • Heating device

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Vacuum Hot Plate Chamber Model PH-224

Vacuum Hot Plate Chamber Model PH-224

High-speed heating process under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.!

The "PH-224 type" is a vacuum hot plate chamber that supports a maximum temperature of 400°C. It is a compact batch furnace type, ideal for small quantities and research and development. It employs a thin heater as the heating source, enabling it to accommodate high-speed temperature profile processes. Additionally, an observation window allows for visibility of the workpiece's condition. The temperature controller, designed specifically for this purpose, can obtain the necessary data for process verification (analog output). It supports air cooling and can reach a maximum temperature of 400°C. ● For more details, please download the catalog or contact us.

  • others

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Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-200 Model"

Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-200 Model"

Maximum temperature 400℃! It is a small batch furnace type, ideal for small quantities and research and development.

The semi-automatic vacuum hot plate chamber "PH-224S-200" uses a ceramic heater as its heat source, enabling it to accommodate high-speed temperature profile processes. The temperature controller can obtain the necessary data for process verification (analog output) through a dedicated type. 【Features】 ○ Air-cooled, supports a maximum temperature of 400°C ○ Compact batch furnace type, ideal for small quantities and research and development ○ Observation window allows visibility of the workpiece condition ○ Valve operation automatically responds (programmable according to the recipe) For more details, please contact us or download the catalog.

  • Other semiconductor manufacturing equipment
  • Heating device

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Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-42 Model"

Semi-Automatic Vacuum Hot Plate Chamber "PH-224S-42 Model"

It is a small batch furnace type, ideal for small quantities and research and development.

The semi-automatic vacuum hot plate chamber "PH-224S-42" is a small batch furnace type, ideal for small quantities and research and development. It uses thin heaters as the heating source, enabling it to accommodate high-speed temperature profile processes. It has the capacity to process three 6-inch wafers or two 8-inch wafers as a wafer heating batch furnace. 【Features】 ○ Maximum temperature: 300°C ○ The temperature controller, being a dedicated type, can obtain necessary data for process verification (analog output) ○ Valve operation: automatic response (programmable according to the recipe) For more details, please contact us or download the catalog.

  • Heating device

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Vacuum Hot Plate Chamber "PH-224D Model"

Vacuum Hot Plate Chamber "PH-224D Model"

Heating processes and material evaluation under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.

The "PH-224D model" vacuum hot plate chamber is ideal for heating processes and material evaluation under vacuum conditions and low oxygen concentration atmospheres for metals, wafers, and more. 【Specifications Customization】 ○ Temperature control range: Room temperature to 200℃ ○ Plate size: 200×200mm ○ Pressure range: -100KPa (vacuum) to 0.02MPa (when filled with N2 gas) For more details, please contact us or download the catalog.

  • Heating device

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