天谷製作所 List of Products and Services

The "A200V" is a single-wafer atmospheric pressure CVD system compatible with φ150 and φ200 mm wafers, covering production from small quantities of diverse products to mass production. By adopting a face-down film formation method, it demonstrates excellent film thickness uniformity, particle control, and embedding performance, depositing silicon oxide films based on SiH4. Additionally, the system can also support options for TEOS-O3 and SiH4-O3. 【Features】 ■ Face-down position ■ Compact device design and configuration ■ Balancing maintainability and high productivity ■ Excellent film thickness uniformity and embedding capability ■ Ensures safety by preventing operators from directly contacting the heating area *For more details, please refer to the PDF materials or feel free to contact us.

• CVD Equipment

The "A6300S" is a continuous atmospheric CVD system for mass production that supports small-diameter wafers with a throughput of 120 wafers per hour. Equipped with an automatic tray exchange system and a head lifting mechanism, it reduces maintenance time and extends production time, while also considering the mass production needs of customers and the safety of operators. 【Features】 ■ High productivity: Capable of processing 120 wafers per hour ■ Heavy metal contamination countermeasures: Prevents metal contamination from the backside of the wafer ■ High performance: Adopts the A63 type head to achieve good film thickness distribution ■ Improved maintainability: Allows for safe maintenance in a short time ■ Footprint: Successfully minimized the number of trays to reduce the equipment area ■ Safety: Ensures high safety through interlocks and optimization of equipment mechanisms *For more details, please refer to the PDF document or feel free to contact us.

• CVD Equipment

The "WULF Series" is a spin-type cleaning device designed for high-resolution photomasks. Equipped with a spin cleaning unit that uses functional water, it can remove organic substances, metal ions, and foreign particles down to detection limit levels through centrifugal force from the workpiece rotation, ozone water, and ammonia-added hydrogen water discharge. Additionally, by switching between various cleaning solutions, it rapidly removes impurities deposited on the workpiece while also providing a safe environmental tool for waste liquid management. 【Features】 ■ Contributes to high cleanliness and improved yield ■ Capable of removing organic substances, metal ions, and foreign particles down to detection limit levels ■ Rapidly removes impurities deposited on the workpiece while also providing a safe environmental tool for waste liquid management ■ Adoption of cleaning solutions and methods that replace RCA cleaning solutions ■ Equipped with a spin cleaning unit that uses functional water *For more details, please refer to the PDF document or feel free to contact us.

• Other cleaning machines

The atmospheric pressure CVD device "AMAX800V" is a continuous atmospheric pressure CVD system compatible with φ200mm wafers, utilizing the reaction characteristics of monosilane gas to form insulating films such as USG, PSG, BPSG, and back surface protective films on silicon substrates. It achieves high throughput through improvements in the transport mechanism. The adoption of SiC trays minimizes heavy metal contamination, and stable process performance is achieved with less thermal aging. 【Features】 ○ High throughput ○ Excellent film formation characteristics ○ Maintenance-friendly ○ Reduced metal contamination (optional) For more details, please contact us or download the catalog.

• CVD Equipment