Adopting SiC trays! A system that enables mass production while keeping costs down.
The "A6300S" is a continuous atmospheric CVD system for mass production that supports small-diameter wafers with a throughput of 120 wafers per hour. Equipped with an automatic tray exchange system and a head lifting mechanism, it reduces maintenance time and extends production time, while also considering the mass production needs of customers and the safety of operators. 【Features】 ■ High productivity: Capable of processing 120 wafers per hour ■ Heavy metal contamination countermeasures: Prevents metal contamination from the backside of the wafer ■ High performance: Adopts the A63 type head to achieve good film thickness distribution ■ Improved maintainability: Allows for safe maintenance in a short time ■ Footprint: Successfully minimized the number of trays to reduce the equipment area ■ Safety: Ensures high safety through interlocks and optimization of equipment mechanisms *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications (Partial)】 ■Size: W1500mm × D2850mm × H2000mm ■Film deposition speed: Up to 350nm/min ■Temperature: Up to 450℃ ■Wafer size: 6 inches or smaller ■Throughput: 120 pieces per hour *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Amaya Manufacturing Co., Ltd. has been developing and selling atmospheric pressure CVD (Chemical Vapor Deposition) equipment since 1970, focusing on atmospheric pressure CVD systems used for semiconductor manufacturing. In recent years, as a challenge to enter new fields, we have developed and sold high productivity atmospheric pressure CVD equipment for solar cell manufacturing. Moving forward, we will continue to work on developing new technologies and aim to be the only company specializing in atmospheric pressure CVD equipment.
