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サンバック 本社

EstablishmentNovember 1, 1995
capital15Ten thousand
number of employees10
addressTokyo/Koto-ku/205 Sumitoshi Sumiyoshi-kan, Twin Tower, 1-19-1 Sumiyoshi
phone03-3635-1701
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last updated:Sep 04, 2020
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RF sputtering device "SP-3400"

Inverted sputtering is also possible! Equipped with a 500W high-frequency power supply, it can deposit metals, oxides, insulators, and more.

The "SP-3400" is an RF sputtering device equipped with three sources for 3-inch cathodes. It features a single 500W high-frequency power supply, enabling the deposition of metals, oxides, insulators, and more. By incorporating two automatic matching units, it allows for reverse sputtering through switching, and it also comes standard with a substrate rotation mechanism to improve the film thickness distribution during deposition. The device uses an operational touch screen, making it easy for beginners to perform automatic operation of the exhaust system, and it is equipped with safety circuits to prevent malfunctions. 【Features】 ■ Three sources for 3-inch cathodes ■ One 500W high-frequency power supply ■ Capable of depositing metals, oxides, insulators, etc. ■ Reverse sputtering is possible by switching with two automatic matching units ■ Standard substrate rotation mechanism to improve film thickness distribution during deposition ■ Operational touch screen for easy automatic operation of the exhaust system, even for beginners *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

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Ceramic coating equipment

Equipped with a substrate driving mechanism, it is capable of rotating, swiveling, and moving the substrate horizontally! The heating heater uses carbon material.

The "Ceramic Coating Device" is a device that coats substrates with ceramic in a high vacuum state. It can raise the chamber temperature to nearly 1200°C. Additionally, a significant feature is that it is equipped with a substrate drive mechanism, allowing the substrate to rotate, pivot, and move horizontally. An electron gun (JEOL 16KW electron gun) is used as the evaporation source, and the crucible section can be controlled for elevation and rotation to accommodate ingot-shaped evaporation materials. For film formation control, it has a shutter mechanism, and it is also possible to set the opening and closing time and the number of repetitions for the motion. 【Features】 ■ Coats substrates with ceramic in a high vacuum state ■ Can raise the chamber temperature to nearly 1200°C ■ Equipped with a substrate drive mechanism, allowing for rotation, pivoting, and horizontal movement of the substrate ■ Uses an electron gun (JEOL 16KW electron gun) as the evaporation source ■ The crucible section can be controlled for elevation and rotation to accommodate ingot-shaped evaporation materials *For more details, please refer to the PDF document or feel free to contact us.

  • Other surface treatment equipment

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High Vacuum Vapor Deposition Device "RD-1230"

With thyristor control, it is possible to adjust the deposition voltage and current values! The exhaust operation is fully automatic.

The high vacuum deposition device "RD-1230" is a compact deposition system for creating perovskite solar cell electrodes. It is equipped with two pairs of resistance heating mechanisms, allowing for the adjustment of deposition voltage and current values through thyristor control. The exhaust system uses a turbo molecular pump for evacuation, and the evacuation operation is fully automated. A quartz crystal oscillation thickness gauge can also be added as an option, enabling high-performance film formation control for a tabletop type. 【Features】 ■ Compact deposition device for creating perovskite solar cell electrodes ■ Equipped with two pairs of resistance heating mechanisms, allowing for adjustment of deposition voltage and current values through thyristor control ■ Exhaust system uses a turbo molecular pump for evacuation, and the evacuation operation is fully automated ■ A quartz crystal oscillation thickness gauge can also be added as an option ■ High-performance film formation control is possible for a tabletop type *For more details, please refer to the PDF document or feel free to contact us.

  • Evaporation Equipment

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High-frequency induction heating vacuum melting furnace "SVM-1000"

Melting metal using high-frequency induction heating! Many customers are using it for research and development purposes.

The "SVM-1000" is an induction heating melting furnace that melts metals through high-frequency induction heating. It can be customized based on the size and material of the crucible, as well as the materials to be melted. It is widely used by many customers for research and development purposes. Additionally, the shape of the mold can be manufactured according to your desired specifications. 【Features】 ■ Melts metals through high-frequency induction heating ■ Used for research and development purposes ■ Customizable based on the size and material of the crucible, as well as the materials to be melted ■ The shape of the mold can be manufactured according to your desired specifications *For more details, please refer to the PDF document or feel free to contact us.

  • Heating device

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Vacuum Drying Device 'E069'

Each heater zone is controlled independently using a PID method, and the reliability of the temperature setpoint is also very high!

The "E069" is a vacuum drying device designed for heating and drying parts under reduced pressure. Each of the six surfaces of the heater zones is controlled independently using a PID method. The reliability of the temperature indication is also very high. Additionally, it is possible to store 19 patterns of programs using a program controller. 【Features】 ■ Heats and dries parts under reduced pressure ■ Each of the six surfaces of the heater zones is controlled independently using a PID method ■ The reliability of the temperature indication is also very high *For more details, please refer to the PDF document or feel free to contact us.

  • Drying Equipment

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