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  4. Semiconductor Manufacturing Equipment
  5. Evaporation Equipment
  6. High Vacuum Vapor Deposition Device "RD-1230"

High Vacuum Vapor Deposition Device "RD-1230"

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last updated:Dec 03, 2020

サンバック 本社
サンバック 本社
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With thyristor control, it is possible to adjust the deposition voltage and current values! The exhaust operation is fully automatic.

The high vacuum deposition device "RD-1230" is a compact deposition system for creating perovskite solar cell electrodes. It is equipped with two pairs of resistance heating mechanisms, allowing for the adjustment of deposition voltage and current values through thyristor control. The exhaust system uses a turbo molecular pump for evacuation, and the evacuation operation is fully automated. A quartz crystal oscillation thickness gauge can also be added as an option, enabling high-performance film formation control for a tabletop type. 【Features】 ■ Compact deposition device for creating perovskite solar cell electrodes ■ Equipped with two pairs of resistance heating mechanisms, allowing for adjustment of deposition voltage and current values through thyristor control ■ Exhaust system uses a turbo molecular pump for evacuation, and the evacuation operation is fully automated ■ A quartz crystal oscillation thickness gauge can also be added as an option ■ High-performance film formation control is possible for a tabletop type *For more details, please refer to the PDF document or feel free to contact us.

    Evaporation Equipment
2020-12-02_13h03_10.jpg

High Vacuum Vapor Deposition Device "RD-1230"

2020-12-02_13h03_10.jpg
2020-12-02_13h03_10.jpg
  • Related Link - https://www.sanvac.com/product/equipment/depositio…

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【Specifications】 ■Achievable pressure: ×10^-5Pa range *At room temperature, no load, during degassing ■Exhaust speed: 2.0×10^-4Pa within 30 minutes from atmospheric pressure *At room temperature, no load, during degassing ■Vacuum chamber dimensions: φ230mm×240mmH hard glass ■Deposition mechanism: Resistance heating method ・AC power supply 2-pole (switchable): for metals ・AC power supply: 12V0~45A/7V0~80A ■Substrate shape: Desired shape within □100mm ■Vacuum exhaust system ・Oil rotary pump: 50L/min [50Hz] ・Turbo molecular pump: 67L/sec *For more details, please refer to the PDF document or feel free to contact us.

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High Vacuum Deposition Device "RD-1230"

High Vacuum Deposition Device "RD-1230"

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Founded in 1995, we are a vacuum equipment manufacturer. For over 25 years, we have been designing and manufacturing "customized equipment tailored to individual needs," focusing on various thin film devices, heat treatment furnaces, melting furnaces, and drying furnaces. We will propose solutions based on your requests, so please let us know your needs "in full."

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