ピュアオンジャパン List of Products and Services

The IC OPTIC Puck is a polyurethane block with a fine pore structure recommended for polishing flat and spherical optical materials. It can be used with high-speed CNC polishing machines and spindle polishing machines, replacing traditional metal or glass molding tools with bonded petal-shaped pads. It is provided in a cylindrical block form, allowing you to shape it into your desired form during use. The shaping method can be viewed in related videos. 【Features】 - Improved polishing capability due to the uniform fine pore structure throughout the product. - Stable processing accuracy regardless of the target shape. - Easy shaping through machining, enabling low costs through multiple reuses. - Less frequent dressing processing, allowing for long hours of polishing. - Supports polishing while maintaining surface shape even for sudden R and other difficult shapes. - Low risk of shape distortion, enabling support for improved accuracy of polished parts. *Please feel free to contact us for more details.

This is a high-purity cerium oxide slurry recommended for precision polishing of optical materials such as borosilicate glass, quartz glass, and glass ceramics. This slurry, which combines cerium oxide with a sharp particle size distribution in a unique coolant, is characterized by its resistance to settling and ease of cleaning. Additionally, due to its high concentration of abrasive particles, it can be used flexibly by diluting it on-site. 【Recommended for the following situations】 ■ Those looking for a cerium oxide slurry with high cleaning properties ■ Those requiring high consistency between batches ■ Those seeking high processing rates and surface quality ■ Those who find it cumbersome to create slurry from powder *Please feel free to contact us for more details.

OPW is a water-soluble diamond suspension designed for final polishing of optical components, ceramics, metals, and more. It can be used immediately upon arrival. The OPW suspension delivers optimal performance in finishing processes from 3 microns to 0.1 microns. We offer products suitable for polishing on pads and pitch plates/PU foils. 【Features】 ■ Tailor-made specifications You can freely choose the type of diamond, grain size, and concentration. ■ Aggregate-free processing Excellent usability due to reliable dispersion. ■ Maintains a high polishing rate through cooling and lubrication. ■ Environmentally friendly and easy to maintain. *For more details, please feel free to contact us.

"Liquid Diamond GAF" is a high-concentration liquid diamond dispersed in deionized water using our proprietary GAF (Aggregation-Free Processing) technology. It is used as a substitute for diamond powder when preparing water-soluble diamond slurries for polishing. It helps prevent the risk of scratches when handling diamonds of sizes smaller than 1 micron. 【Features】 ■ Dramatically Simplified Slurry Preparation The labor-intensive dispersion of submicron diamonds is unnecessary, saving both time and costs. It can be easily measured to match the required slurry concentration. ■ Improved Reproducibility Reliable dispersion of diamonds ensures that scratch-free polishing is consistently maintained. ■ Environmentally Friendly No chemical additives such as dispersants or surfactants are used. * A bactericide is included to prevent contamination from bacteria and other sources. Cleaning up diamond dust generated during the slurry preparation process is no longer necessary. * For more details, please refer to the PDF document or feel free to contact us.