シナノ精機 List of Products and Services

We would like to introduce a case of the small batch-type sputtering device "SPB-311" developed as a film-forming apparatus. It features a clean exhaust system with a cryopump as the main pump and is equipped with a magnetron cathode. It allows for the selection of RF/DC power supplies. Shinano Seiki supports the entire lifecycle of the device, from design to after-sales service, through collaboration with partner companies. 【Main Specifications】 ■ Clean exhaust system with a cryopump as the main pump ■ Equipped with a magnetron cathode (up to 3 units) ■ Selection of RF/DC power supplies available ■ Substrate rotation mechanism ■ Fully automatic touch panel sequence with manual operation available *For more details, please download the PDF or feel free to contact us.

We would like to introduce examples of our company's "design and manufacturing equipment." Starting with a load-lock type sputtering and deposition device equipped with a multi-stage stocker, we also produce plasma treatment devices suitable for mass production and continuous operation, as well as atmosphere control devices that can be used for managing moisture and oxygen levels. Shinano Seiki supports the entire lifecycle of the equipment, from design to after-sales service, through collaboration with partner companies. 【Equipment Details (Partial)】 ■ Load-lock type sputtering and deposition device - Manual transport / Roller transport - Equipped with multi-stage stocker ■ Plasma treatment device - Plasma etching treatment of pipe-shaped workpieces - Suitable for mass production and continuous operation *For more details, please download the PDF or feel free to contact us.

We would like to introduce a case study of our "Precision Cleaning Equipment." This equipment is used for cleaning precision components such as semiconductor wafers and hard disks, employing a batch format to remove contamination from particles, chemicals, and metals. Since it cleans wafers one by one, it is suitable for small-batch production of various types and high-functionality cleaning. 【Product Specifications】 ■ Semiconductor wafers (SiC, GaN, silicon, sapphire, etc.), MEMS ■ Wafer materials: SiC, Si, GaAs, GaN, glass, LT substrates ■ Wafer sizes: 2 to 12 inches ■ Number of processing chambers: 1 to 4 ■ Chemicals: Up to 2 types (optional: 3 types) *For more details, please download the PDF or feel free to contact us.

Our company has developed and manufactured a "precision cleaning device" using a spin cleaning method in the cleaning process of semiconductor manufacturing. Both the development machine and the mass production machine underwent design, mechanical and electrical assembly, adjustment, debugging, inspection, shipping, and on-site startup. Additionally, we supported the mass production by creating necessary documentation, independently developing inspection sheets, and creating inspection jigs. [Overview of Manufacturing Achievements] ■ Developed and manufactured a precision cleaning device using a spin cleaning method in the cleaning process of semiconductor manufacturing. *For more details, please download the PDF or feel free to contact us.

Our company has implemented the design, manufacturing, and assembly of a "plasma treatment device" in response to requests for performance improvements of existing equipment in the automotive parts manufacturing process. It enables treatment that is stronger than UV treatment but weaker than blasting or polishing. It is suitable for processing elongated workpieces, is compact, and has low running costs. Please feel free to contact us when you need our services. 【Overview of Manufacturing Achievements】 ■ Capable of processing workpieces with low mechanical strength ■ Non-contact treatment that does not damage the workpiece ■ Does not use liquids ■ Can process not only metals but also resins ■ Only Ar gas and water are required for the process ■ Does not produce dust or waste ■ Can be installed in clean rooms (excluding vacuum pumps) *For more details, please download the PDF or feel free to contact us.

Our company has implemented the design, manufacturing, and assembly of a "small sputtering device" in response to requests for updates to existing equipment and productivity improvements in the component manufacturing process of medical device production. Through collaboration with partner companies, we can design equipment tailored to customer needs. Regular maintenance is also available as an after-service. Additionally, we have received positive feedback for our after-service support, and by conducting regular maintenance, we are achieving longer lifespans for the equipment. [Overview of Manufacturing Achievements] ■ When applying a film to the fiber surface using sputtering, the film formation occurs under vacuum, preventing the adhesion of impurities and resulting in products with better performance. *For more details, please download the PDF or feel free to contact us.

Our company has carried out the design, manufacturing, and assembly of "vacuum bake devices" in the production process of components for consumer electrical appliances. We undertook assembly work from a manufacturing equipment manufacturer and performed mechanical and electrical assembly tasks. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ A device for heating workpieces under vacuum conditions in a display manufacturing line. *For more details, please download the PDF or feel free to contact us.

Our company has carried out the design, manufacturing, and assembly of "UV irradiation devices" for semiconductor manufacturing. We received a request to produce a demo unit for a device manufacturer and conducted mechanical and electrical assembly work. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ UV irradiation device that emits near-ultraviolet light under a heated low-moisture atmosphere *For more details, please download the PDF or feel free to contact us.

Our company received an OEM production request from a semiconductor manufacturing equipment manufacturer and carried out the mechanical and electrical assembly of "CVD equipment." We were involved in the manufacturing of both development and mass production machines, achieving production and mass production in a short period. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ Mass production compatible 300mm wafer plasma CVD equipment ■ Improved gas usage efficiency with a low-capacity chamber ■ High reproducibility between chambers and wafers ■ Low COO ■ Improved maintainability ■ High power efficiency *For more details, please download the PDF or feel free to contact us.

We would like to introduce the additional modifications made to the mass spectrometer we handled, including mechanical and electrical modifications as well as software changes. A major electronic components manufacturer requested gas mass analysis in a vacuum chamber, leading to the implementation of additional mechanical, electrical, and software modifications. After the modifications, the system has been used without any issues. Additionally, our company can accommodate customer needs from design to modifications. 【Overview of Production Achievements】 ■ Additional modifications to the mass spectrometer ■ Mechanical and electrical modifications and software changes *For more details, please download the PDF or feel free to contact us.

We have carried out the replacement of turbo molecular pumps for high vacuum exhaust, modifications to machinery and electrical systems, and software changes. Due to a decline in the performance of the vacuum pump from long-term use, there was a request for replacement with a new vacuum pump. Although it was replaced with a pump of different specifications, we were able to keep the replacement parts and costs down. After the modifications, there were some issues caused by the parts, but we responded quickly and resolved them, which has been well received. [Overview of Production Achievements] ■ Replacement of turbo molecular pumps for high vacuum exhaust ■ Modifications to machinery and electrical systems, and software changes *For more details, please download the PDF or feel free to contact us.

Due to the inspection equipment manufacturer being fabless, there was a request for equipment assembly, and we carried out the design, manufacturing, and assembly of a "vacuum inspection device." This is a vacuum prober capable of on-wafer measurements of MEMS devices that require operation in a vacuum environment, such as RF MEMS devices and quartz oscillator MEMS devices, at high and low temperatures (−60°C to +300°C). The equipment consists of a stage chamber, probing chamber, probe manipulator, retraction mechanism, microscope camera, exhaust unit, gas line, and control unit, with all operations manageable from the operation panel. [Overview of Manufacturing Achievements] ■ Vacuum prober capable of on-wafer measurements at high and low temperatures (−60°C to +300°C) ■ All operations can be managed from the operation panel ■ We specialize in vacuum equipment, allowing us to handle everything from design to assembly related to equipment configuration and vacuum. *For more details, please download the PDF or feel free to contact us.

Our company received an OEM production request from a semiconductor manufacturing equipment manufacturer and implemented the internal wiring. We conducted both internal and external wiring for both the development and mass production machines. Additionally, we created materials for the wiring diagrams and independently developed inspection sheets and inspection jigs to support mass production. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ Mass production-capable 300mm wafer plasma CVD equipment ■ Improved gas usage efficiency through low-capacity chambers ■ High reproducibility between chambers and wafers ■ Low COO ■ Enhanced maintainability ■ High power efficiency *For more details, please download the PDF or feel free to contact us.

We received an OEM production request from a semiconductor manufacturing equipment manufacturer and carried out harness (electrical wiring) processing at our company. We proposed simplifications for harness processing and introduced software for harness inspection, achieving mass production. Please feel free to contact us when you need our services. 【Overview of Production Achievements】 ■ Mass production compatible 300mm wafer plasma CVD equipment ■ Improved gas usage efficiency with low-capacity chambers ■ High reproducibility between chambers and wafers ■ Low COO ■ Enhanced maintainability ■ High power efficiency *For more details, please download the PDF or feel free to contact us.