From design to after-service of the equipment! We can offer various equipment proposals.
We would like to introduce a case of the small batch-type sputtering device "SPB-311" developed as a film-forming apparatus. It features a clean exhaust system with a cryopump as the main pump and is equipped with a magnetron cathode. It allows for the selection of RF/DC power supplies. Shinano Seiki supports the entire lifecycle of the device, from design to after-sales service, through collaboration with partner companies. 【Main Specifications】 ■ Clean exhaust system with a cryopump as the main pump ■ Equipped with a magnetron cathode (up to 3 units) ■ Selection of RF/DC power supplies available ■ Substrate rotation mechanism ■ Fully automatic touch panel sequence with manual operation available *For more details, please download the PDF or feel free to contact us.
Inquire About This Product
basic information
For more details, please download the PDF or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
【Usage】 ■Product sample production ■Research and development ■Test chip production *For more details, please download the PDF or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
Shinano Seiki has been developing its business under the management philosophy of "pursuing customer satisfaction and technological capability to the utmost and contributing to society." Each member of the group, based on this management philosophy, is uniting their efforts with high technology, a desire for improvement, and a professional mindset to contribute to customer satisfaction and the development of society. Furthermore, with the motto "cutting-edge technology is born from the field," we are adopting a field-oriented approach as our guiding principle and are making daily efforts.
