A plasma etching and deposition device that can be configured according to its purpose.
We would like to introduce our "Corial 200 Series." This research and development equipment utilizes a common platform and can be configured as RIE, ICP, ICP+RIE, ICP-CVD, or PECVD depending on the application. Wafer sizes are 50mm, 100mm, 150mm, and 200mm. 【Features】 ■ Utilizes a common platform ■ RIE, ICP, ICP+RIE, ICP-CVD, or PECVD equipment ■ Designed for research and development ■ Wafer sizes are 50mm, 100mm, 150mm, and 200mm * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.
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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en