ティー・ケイ・エス List of Products and Services

This document explains the basics of the design and applications of metal belts manufactured by Belt Technologies. It includes reasons for considering the introduction of metal belts into your design, as well as information on metal belts, drive tapes, various applications, and design considerations. We hope this will help you understand the many advantages of metal belts and serve as a useful resource for the essential information you need. Please take a moment to read it. [Contents (excerpt)] ■ Reasons for considering the introduction of metal belts into your design ■ Metal belts, drive tapes, and various applications ■ Pulleys ■ Surface treatment ■ Design considerations *For more details, please refer to the PDF document or feel free to contact us.

• Technical and Reference Books
• Belts and pulleys

FHR Anlagenbau GmbH is an innovative company in the field of vacuum processes and thin film technology. It was established in 1991 in Dresden, Germany, by a group of engineers with excellent technical skills aimed at developing and selling new concepts and solutions for multiple applications of thin films. FHR provides thin film technology and offers customized equipment for a wide range of applications to customers worldwide. [Included in the FHR Technology Portfolio] ■ Advanced metallization technology through magnetron sputtering and CVD ■ Reactive sputtering technology for the deposition of oxides and nitrides ■ Advanced etching technology supported by high-density plasma sources ■ Flash lamp annealing (FLA) for processing and modifying semiconductors, metals, ceramics, nanostructures, and photonic materials ■ Atomic layer deposition (ALD) technology for single-layer bonding with excellent uniformity through advanced film deposition control on complex 3D shapes *For more details, please refer to the PDF document or feel free to contact us.

• others

Atomic Layer Deposition (ALD) is a special coating method within CVD. The complementary and self-limiting surface reactions in the ALD process provide uniform films with controlled thickness down to the nanometer scale and excellent step coverage on complex 3D surface geometries. For ALD processing, FHR Anlagenbau GmbH offers custom-made reactor tools designed for R&D activities and mass production on an industrial scale. [Coating Method] ■ Performed by alternating substrate exposure to at least two chemical reactants (precursors) ■ The first precursor is flashed onto the substrate ■ The precursor reacts with reactive surface sites until there are no unreacted surface sites left (saturation) ■ The gaseous reaction byproducts of the first precursor are purged with inert gas ■ The second precursor is flashed, and surface reactions occur again until saturation is reached ■ After purging the reaction, in the case of residuals from the second precursor, the cycle is resumed by flashing the first precursor *For more details, please refer to the PDF document or feel free to contact us.

• Other processing machines

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

• Sputtering Equipment

We handle the 'Star.500-EOSS(R)' from the German company FHR. The 'Star.500-EOSS(R)' is a magnetron sputtering system designed for optical filter film deposition. To minimize particles during film deposition, a sputter-up method is employed. It accommodates flat and curved substrates up to 200mm in diameter, and a substrate heating mechanism can also be integrated. 【Features and Benefits】 ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement in film quality and defect-free deposition achieved through the combination of a cylindrical sputter cathode and sputter-up ■ Long target life and minimized variations in deposition rate due to cylindrical targets ■ Fully automated process control *For more details, please download the PDF or contact us.

• Sputtering Equipment