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  3. Siconnex Japan(サイコネックス ジャパン)
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Siconnex Japan(サイコネックス ジャパン)

addressTokyo/Meguro-ku/3-2-17 Jiyugaoka
phone080-4896-5740
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last updated:Jul 10, 2025
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Siconnex Japan(サイコネックス ジャパン) List of Products and Services

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Fully Automatic Device BATCHSPRAY Clean Autoload Fully Automatic Device BATCHSPRAY Clean Autoload
BATCHSPRAY Acid Autoload BATCHSPRAY Acid Autoload
BATCHSPRAY Solvent Autoload BATCHSPRAY Solvent Autoload
BATCHSPRAY Acid/Solvent Autoload BATCHSPRAY Acid/Solvent Autoload
BATCHSPRAY Acid/Clean Autoload BATCHSPRAY Acid/Clean Autoload
Resist stripping device BATCHSPRAY Solvent Resist stripping device BATCHSPRAY Solvent
Wet Etching Equipment BATCHSPRAY Acid Wet Etching Equipment BATCHSPRAY Acid
Wet

Wet Etching Equipment BATCHSPRAY Acid

**Efficient Wet Etching** Siconnex, which continues to expand its achievements, is a trusted brand in the semiconductor industry, providing solutions for etching, cleaning, and resist stripping applications. Our products prioritize cost-effectiveness and sustainability, promising significant cost reductions for major semiconductor companies around the world that utilize our pioneering ideas. Wet etching with batch spray equipment features high throughput and low chemical consumption, making it ideal for mass production facilities looking to reduce running costs and enhance environmental compliance. Additionally, its small footprint and ability to handle multiple processes in one unit make it highly recommended for fabs with limited cleanroom space.

Wet process equipment "BATCHSPRAY Acid"

100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.

Our semi-automatic device stands out for its high performance, efficient chemical recirculation, minimal installation area, and optimized space efficiency. 【Features】 ■ Throughput of up to 150 wph ■ Uniformity with less than 1% variation ■ Installation area of less than 2 m² ■ Chemical recirculation through a tank system ■ Process executable with SiC/GaN ■ Usable with chambers for 25 or 50 wafers ■ Extractable process chamber *For more details, please refer to the PDF document or feel free to contact us.

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BATCHSPRAY Acid/Clean Autoload

100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].

This 3-chamber system utilizes a patented retainer comb processing system, accommodating all types of wet etching processes and cleaning applications. The combination of acid/cleaning allows for high process flexibility and high throughput. By using SicOzone instead of peroxides or sulfuric acid for sustainable processes such as cleaning and resist stripping, it can reduce the consumption of chemicals and deionized water by up to 90%. 【Features】 ■ Throughput of up to 400 wph ■ Two cleaning process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation through a tank system ■ EPD - End Point Detection *For more details, please download the catalog or feel free to contact us.

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