Siconnex Japan(サイコネックス ジャパン) Company Profile

Siconnex, in collaboration with Aichi Institute of Technology and Technique Japan, will hold a webinar on November 28, 2025, focusing on innovations in the wet etching and resist stripping processes. Siconnex Japan LLC has announced the hosting of a free specialized webinar titled "Cutting Edge of Wet Processes - Fundamentals of Wet Etching, Environmental Compatibility, and Integration with Resist Stripping." This online event will take place on November 28, 2025 (Friday) from 15:00 to 16:30 (Japan Standard Time) and is aimed at professionals in semiconductor and electronic device manufacturing. Wet etching is often regarded as an "old technology" compared to dry etching, but it remains an essential standard process in modern manufacturing. Technological development is also progressing, with environmental compatibility and occupational health and safety (EHS) emerging as important themes. This webinar will focus on the fundamentals of wet etching, as well as the latest technological innovations in equipment and chemicals related to the resist stripping process that follows the etching process. It will introduce efforts to enhance process efficiency while improving safety and reducing environmental impact.

Our company will exhibit at "SEMICON Japan 2025," which will be held in December 2025.