大川興産 List of Products and Services

The recovery device for fluorine-based cleaning solvents from Okawa Kousan, "OK-GREEN1," allows you to simply input waste liquid containing HFE/HFO/HFC/chlorinated solvents and reliably recover high-quality solvent regeneration liquid. The recovered solvent can be safely reused. By reusing the separated cleaning agent, you can reduce the amount of new cleaning agent purchases, contributing to lower running costs. With a power supply of AC100V, it can be used anywhere there is space, and continuous operation is possible by connecting it to a cleaning device and piping. 【Features】 ■ Recovery of regeneration liquid is possible just by inputting waste liquid ■ Solvent recovery rate of over 99% is achievable ■ Can be connected to cleaning machines *For other functions and details, please download the catalog and contact us.

• Other cleaning machines

Environmentally friendly and safe fluorinated solvents. The high unit price has been a drawback until now. Okawa Kousan's solvent recovery system offers a high recovery rate of up to 99%, allowing for a reduction in cleaning costs while introducing fluorinated solvents. 【Features】 - Just pour in the waste liquid to recover regenerated liquid - Recovery rate of solvents can exceed 99% - Can be connected to cleaning machines - Operates on AC 100V power, so it can be used anywhere with available space - Can reduce industrial waste disposal costs - Recovered solvents can be safely reused *For other functions and details, please download the catalog and contact us.

• Other cleaning machines
• Distillation Apparatus
• Wastewater/wastewater treatment equipment

The solvent recovery device "OK-GREEN1" from Okawa Kousan can stably recover high-quality solvent regeneration liquid just by pouring in waste liquid containing HFE/HFC/chlorinated solvents. 【Features】 - Regeneration liquid can be recovered just by pouring in waste liquid - Solvent recovery rate of over 99% is possible - Can be connected to cleaning machines - Operates on AC 100V power supply, so it can be used anywhere there is space - Can reduce industrial waste disposal costs - Recovered solvents can be safely reused *For other functions and details, please download the catalog and contact us.

• Other cleaning machines
• Distillation Apparatus
• Wastewater/wastewater treatment equipment

The "De-greasing Cleaning Machine (Co-solvent Method)" by Okawa Kousan uses two types of cleaning solvents for cleaning and drying, achieving powerful drying performance, allowing for solvent selection with a focus on safety. Additionally, the cleaning solvent is returned to the cleaning tank and reused through the distillation and separation devices. 【Features】 ◆ By regenerating and reusing the cleaning solvent, solvent consumption is greatly reduced ◆ Excellent drying performance allows for a focus on safety during solvent selection ◆ Since the items being cleaned are not exposed to high temperatures, handling is easy 【For more details, please download the catalog or feel free to contact us】

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

The "Degreasing Cleaning Machine (Co-solvent Method)" by Okawa Kousan uses two types of cleaning solvents for cleaning and drying, allowing for powerful drying performance and enabling the selection of solvents with a focus on safety. Additionally, the cleaning solvent is returned to the cleaning tank and reused through a distillation device and a separation device. 【Features】 ◆ By regenerating and reusing the cleaning solvent, solvent consumption is drastically reduced ◆ Excellent drying performance allows for a focus on safety when selecting solvents ◆ Since the items being cleaned are not exposed to high temperatures, handling is easy 【For more details, please download the catalog or feel free to contact us】

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

◆ Chlorinated solvent cleaning machines can be customized to propose cleaning machines that meet your specifications, from manual to automatic models. ◆ We can accommodate basket cleaning machines and inline cleaning machines. ◆ Cleaning experiments are also possible. ◆ Compatible solvents 【Chlorinated organic solvents】 - Methylene chloride (dichloromethane) Methylene chloride, Metaclean, etc. - AK-225 (HCFC-225)

• Engine parts

◆ We offer customized cleaning machines that meet your specifications, ranging from manual to automatic organic solvent cleaning machines. ◆ Compatible with basket cleaning machines and inline cleaning machines. ◆ Cleaning experiments are also possible. ◆ Compatible solvents: 【Chlorinated organic solvents】 - Methylene chloride (dichloromethane) Methylene chloride, Metaclean, etc. - AK-225 (HCFC-225) 【Inert organic solvents】 - HFE (hydrofluoroether) - HFC (hydrofluorocarbon)

• Engine parts

The co-solvent method involves cleaning and drying using two types of cleaning solvents. It is a cleaning system that cleans with hydrocarbon-based cleaning solvents (HC solvents) and rinses and dries with HFE/HFC solvents (rinsing solvents). The dirt dissolved in the HC solvent is distilled and regenerated using an HC vacuum distillation machine and is discharged outside the equipment. The HC solvent brought into the rinsing solvent goes through a solvent separation device, and the HC solvent and rinsing solvent are returned to their respective cleaning tanks for reuse. By cleaning with HC solvents that have high surface tension and rinsing and drying with rinsing solvents that have low surface tension, high cleaning precision can be expected. Since the items being cleaned are not exposed to high temperatures, they are also easy to handle. [For more details, please download the catalog or feel free to contact us.]

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

Cleaning with hydrocarbon (HC) cleaning solvents ⇒ Rinsing with HFE solvent vapor ⇒ Collecting fast-drying HFE solvent in the drying process (end of drying and cleaning) ⇒ Removal. During cleaning, HC solvents are covered by HFE vapor and do not come into direct contact with air, eliminating the risk of ignition. The boiling point of the HFE solvent used in the rinsing process is 56°C, and the surface temperature of the items being cleaned does not rise above 56°C. Handling of the products after cleaning becomes very easy. All solvents used in this device can be recovered and reused (optional). Sales will begin for two models: the 300 type and the 600 type. The dimensions of each cleaning fixture are 200mm × 300mm × 200mmH and 290mm × 350mm × 250mmH, respectively.

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the extensive know-how that accompanies it, achieving a quality that is indistinguishable from a new mask. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into new liquid through distillation and HC/HFE separation equipment, allowing for reuse. 【Features】 - Thin film masks are sensitive to thermal stress, and this is addressed by washing at room temperature to eliminate thermal stress. - With the incorporation of a distillation unit, the cleaning solution is rejuvenated into new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional full liquid replacement. - A cleaning machine for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.

• Other cleaning machines

Most of the "water" that adheres to the glass substrate and is brought into the HFE drying device is removed from the device through specific gravity separation. The moisture that is supersaturated in the HFE solvent is reliably removed from the device by the "moisture removal device." A large amount of adhered "water" rapidly rises to the surface of the HFE liquid. 【Features】 ○ Significantly reduced energy consumption required for drying ○ Improved cleaning speed ○ Reliable removal of trace moisture contained in the HFE solvent For more details, please contact us or download the catalog.

• Other cleaning machines
• Drying Equipment

The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the many know-how associated with it, achieving a quality equivalent to that of new masks. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into a new liquid through distillation and HC/HFE separation devices, allowing for reuse. 【Features】 ○ Thin film masks are vulnerable to thermal stress, which is mitigated by washing at room temperature to eliminate thermal stress. ○ With the incorporation of a distillation unit, the cleaning solution is rejuvenated into a new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional complete liquid replacement. ○ A cleaning device for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.

• Other cleaning machines

Co-solvent method for cleaning and drying using two types of cleaning solvents. This cleaning system uses hydrocarbon-based cleaning solvents (HC solvents) for cleaning and HFE/HFC solvents (rinse solvents) for rinsing and drying. The dirt dissolved in the HC solvent is distilled and regenerated using an HC vacuum distillation machine and is discharged outside the equipment. The HC solvent brought into the rinse solvent undergoes a solvent separation process, and the HC solvent and rinse solvent are returned to their respective cleaning tanks for reuse. 【Features】 ○ Economical The cleaning solvent is reused due to the HC/HFE distillation unit and HC/HFE separation unit (significantly reduced solvent consumption). The expected solvent usage is calculated and presented during estimation. ○ Safe Solvents of safe Class 4 and Class 3 petroleum products with high flash points can be used. Non-cleaned items do not exceed the boiling point temperature of the fluorinated cleaning solvent. ○ Cleaning Precision After cleaning with hydrocarbon-based cleaning solvents with a surface tension of about 25 nN/m, rinsing and drying are performed with fluorinated cleaning solvents with a surface tension of about 13.6 nN/m. High-precision cleaning results can be expected. ● For other functions and details, please download the catalog.

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

Waste liquids from HFE/HFC/chlorinated solvents still contain recoverable solvents. We will reliably recover solvents from the waste liquid that are equivalent to new liquid. The waste liquid after recovery can be treated as regular waste oil or industrial waste, rather than as difficult-to-treat fluorinated waste. For companies that use large amounts of HFE/HFC/chlorinated solvents, we recommend adopting OK-GREEN1 for both environmental and cost benefits. Additionally, by incorporating it into cleaning equipment, it has become possible to clean while continuously reusing the solvent, extracting only the "dirt" during the cleaning process.

• Other cleaning machines
• Distillation Apparatus
• Wastewater/wastewater treatment equipment

Cleaning with hydrocarbon (HC) based cleaning solvent ⇒ Rinsing with HFE solvent vapor ⇒ Recovery of fast-drying HFE solvent in the drying process (end of drying and cleaning) ⇒ Removal During cleaning, HC solvent is covered by HFE vapor and does not come into direct contact with air, eliminating the risk of ignition. The boiling point of the HFE solvent used in the rinsing process is 56°C, and the surface temperature of the items being cleaned does not rise above 56°C. Handling of the products after cleaning becomes very easy. All solvents used in this device can be recovered and reused (optional). Sales will begin for two models: Type 300 and Type 600. The dimensions of each cleaning fixture are 200mm × 300mm × 200mm H and 290mm × 350mm × 250mm H, respectively.

• Ultrasonic Cleaner
• Other semiconductor manufacturing equipment
• Other environmental equipment

Optical lenses and similar items are cleaned with alkaline, acidic, or neutral detergents, and then go through a pure water rinse process before being sent to a drying system using HFE/HFC solvents. The large amount of water brought into the drying system can be easily removed from the equipment due to the difference in specific gravity with the solvent. The cause of water stains after cleaning is the trace amounts of moisture that gradually dissolve into the drying solvent. Keeping this moisture at a reliably low concentration leads to zero water stains. By equipping our developed "Moisture Removal Device (optional)," a reliable and safe drying process can be expected. Additionally, by combining it with the "Automatic Alcohol Concentration Management Device for HFE/HFC," which is scheduled to be released soon, a safer drying system can be established.

• Other cleaning machines
• Other semiconductor manufacturing equipment