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Electronic Components and Semiconductors
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グロース

Establishment2008 year
capital300Ten thousand
number of employees17
addressKanagawa/Naka-ku, Yokohama-shi/6-84-2 Ota Town, Daiki Life Yokohama Building
phone045-680-4722
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last updated:Oct 27, 2025
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FPGA design and development FPGA design and development
Power supply unit design and development Power supply unit design and development
Wireless communication module development Wireless communication module development
Artwork design Artwork design
Noise countermeasures in artwork design Noise countermeasures in artwork design
Heat management in artwork design Heat management in artwork design
High-speed transmission line design in artwork design High-speed transmission line design in artwork design
Large-scale circuit design in artwork design. Large-scale circuit design in artwork design.
Circuit design support Circuit design support
Substrate manufacturing Substrate manufacturing
Bear chip implementation Bear chip implementation
BGA rework BGA rework
High-speed

High-speed transmission line design in artwork design

To achieve stable transmission of high-speed signals, the design of the transmission path is extremely important. This category explains essential design techniques for high-speed transmission, including impedance control of signal lines on the substrate, suppression of crosstalk, prevention of reflections, and optimization of refraction and delay. As miniaturization and high-density mounting progress, practical know-how is widely introduced, such as pattern layout to maintain signal quality and minimize noise, placement of ground planes, and innovative layer configurations. This provides a foundation for artwork design that maximizes the high-speed communication performance of the system.

Example: From high-speed transmission artwork to lens assembly.

A case where we addressed the combination of artwork design and existing implementation technologies!

We would like to introduce a case where we received a request for high-speed transmission artwork (10Gbps × 8 lanes) to lens assembly. Considering the performance (characteristics of each signal), the capabilities of the wire bonder, and the shape of the lens, we determined the die pad shape, the position of the second bonding, and the pattern layout. We accurately aligned the center of the lens above the center of the two optoelectronic device emission areas that were precisely die-mounted, using image recognition to position the center of the microlens array one point at a time. [Case Overview] ■ Challenge - The center of the emission point of the bare chip must be aligned with the center of the lens with an accuracy of a few micrometers, but there is no budget for the production of special alignment jigs. ■ Result - The center of the emission area of the optoelectronic device directly below was aligned with the center of the lens directly above, achieving implementation without creating special jigs. *For more details, please refer to the related links or feel free to contact us.

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