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  3. クリーン・テクノロジー
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クリーン・テクノロジー

addressNiigata/Nagaoka-shi/1-4-4 Higashitakami
phone0258-24-5349
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last updated:Feb 20, 2024
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クリーン・テクノロジー List of Products and Services

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Clamp-type HP device

"Even warped substrates can be uniformly heated" By adopting a clamp structure, it is possible to uniformly heat while suppressing warping of the substrate!

When heating the substrate in processes such as FOPLP and FCBGA, we are troubled by the issue of "warping during heating." The device that solves this "warping during heating" is the "Clamp-type HP device." 【Features】 ■ Adjustable clamping time, force, and timing ■ Plate temperature: ±1℃ *For details, please request materials or view the PDF data from the download.

  • Other semiconductors

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FILM device

"Coating with high-performance film" Ideal for positive and negative electrodes of automotive lithium-ion batteries and films for 3D televisions!

The "FILM device" is a high-performance coating device for membranes. Clean Technology Co., Ltd.'s FILM device achieves a high-precision film thickness distribution of ±2% or less using a slot die. It is ideal for the positive and negative electrodes of lithium-ion batteries for vehicles and films for 3D televisions. For more details, please download the catalog or contact us. 【Features】 ■ Achieves a high-precision film thickness distribution of ±2% or less using a slot die ■ High-precision control of drying oven temperature (oven distribution ±2℃, Film TD direction distribution ±1℃) ■ Realization of ALL flat transport with an archless drying oven ■ Contribution to GX (Green Transformation) ■ Total line coordination available at our company *For more details, please request materials or view the PDF data from the download.

  • Other processing machines

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UV device

"The lamp has a long lifespan" - Economical with low running costs!

The UV device uses ultraviolet (UV) light to remove organic substances from the substrate surface. 【Features】 ■ It removes organic contaminants from the substrate surface using UV light at wavelengths of 185nm and 254nm generated by our own low-pressure mercury lamps. ■ The lamp has a guaranteed lifespan of 6000 hours, achieving low running costs. *For more details, please request documentation or view the PDF data available for download.

  • Ashing device

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Multi-stage HP-CP device

Achieving high precision in temperature accuracy: Simultaneous heating/cooling of multiple substrates within the same frame is possible.

【Features】 ■ Uniform heating and cooling of various substrates using hot plates and cold plates. ■ The hot plate can control a maximum substrate temperature of 150±3.0℃, and the cold plate can control a temperature of 23±1.0℃. ■ Proximity pins can be removed or replaced. ■ The hot plates and cold plates can achieve static electricity removal through our company's unique surface treatment.

  • Other semiconductor manufacturing equipment

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UV ozone assaying device

Dry cleaning device that can expect synergistic effects from each element: UV irradiation, high-concentration ozone, and temperature heating! Low running costs and economical!

This is a dry cleaning device that is expected to have a synergistic effect from UV irradiation, high-concentration ozone, and temperature heating. The UV lamp is economical due to its long lifespan and low cost, resulting in low running costs. 【Features】 - A dry cleaning device that is expected to have a synergistic effect from UV irradiation, high-concentration ozone, and temperature heating - The UV lamp is economical due to its long lifespan and low cost, resulting in low running costs - Ozone concentration control is possible - Substrate heating with an IR heater improves cleaning reaction efficiency *For more details, please request materials or view the PDF data from the download section.

  • Other machine tools

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  • ”分離できるか?”ではなく”どう分離するか” 分離効率×ランニングコスト×安定稼働 業界・用途に応じた多様な技術と経験 実用レベルで選ばれる遠心分離機
  • 義務化された熱中症対策に取り組む製造現場、工場、物流倉庫へ 排気熱風なく室温-4.1℃※の冷風を 工事不要で暑さ対策 気化式スポットクーラー ※環境条件…室温35℃/湿度50%/風量「中」
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