クリーン・テクノロジー Product Lineup

When heating the substrate in processes such as FOPLP and FCBGA, we are troubled by the issue of "warping during heating." The device that solves this "warping during heating" is the "Clamp-type HP device." 【Features】 ■ Adjustable clamping time, force, and timing ■ Plate temperature: ±1℃ *For details, please request materials or view the PDF data from the download.

• Other semiconductors

The "FILM device" is a high-performance coating device for membranes. Clean Technology Co., Ltd.'s FILM device achieves a high-precision film thickness distribution of ±2% or less using a slot die. It is ideal for the positive and negative electrodes of lithium-ion batteries for vehicles and films for 3D televisions. For more details, please download the catalog or contact us. 【Features】 ■ Achieves a high-precision film thickness distribution of ±2% or less using a slot die ■ High-precision control of drying oven temperature (oven distribution ±2℃, Film TD direction distribution ±1℃) ■ Realization of ALL flat transport with an archless drying oven ■ Contribution to GX (Green Transformation) ■ Total line coordination available at our company *For more details, please request materials or view the PDF data from the download.

• Other processing machines

The UV device uses ultraviolet (UV) light to remove organic substances from the substrate surface. 【Features】 ■ It removes organic contaminants from the substrate surface using UV light at wavelengths of 185nm and 254nm generated by our own low-pressure mercury lamps. ■ The lamp has a guaranteed lifespan of 6000 hours, achieving low running costs. *For more details, please request documentation or view the PDF data available for download.

• Ashing device

【Features】 ■ Uniform heating and cooling of various substrates using hot plates and cold plates. ■ The hot plate can control a maximum substrate temperature of 150±3.0℃, and the cold plate can control a temperature of 23±1.0℃. ■ Proximity pins can be removed or replaced. ■ The hot plates and cold plates can achieve static electricity removal through our company's unique surface treatment.

• Other semiconductor manufacturing equipment

This is a dry cleaning device that is expected to have a synergistic effect from UV irradiation, high-concentration ozone, and temperature heating. The UV lamp is economical due to its long lifespan and low cost, resulting in low running costs. 【Features】 - A dry cleaning device that is expected to have a synergistic effect from UV irradiation, high-concentration ozone, and temperature heating - The UV lamp is economical due to its long lifespan and low cost, resulting in low running costs - Ozone concentration control is possible - Substrate heating with an IR heater improves cleaning reaction efficiency *For more details, please request materials or view the PDF data from the download section.

• Other machine tools