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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Multi-stage HP-CP device

Multi-stage HP-CP device

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last updated:Apr 16, 2024

クリーン・テクノロジー
クリーン・テクノロジー
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Achieving high precision in temperature accuracy: Simultaneous heating/cooling of multiple substrates within the same frame is possible.

【Features】 ■ Uniform heating and cooling of various substrates using hot plates and cold plates. ■ The hot plate can control a maximum substrate temperature of 150±3.0℃, and the cold plate can control a temperature of 23±1.0℃. ■ Proximity pins can be removed or replaced. ■ The hot plates and cold plates can achieve static electricity removal through our company's unique surface treatment.

    Other semiconductor manufacturing equipment
多段式HP装置[1].jpg

Multi-stage HP-CP device

多段式HP装置[1].jpg
多段式HP装置[1].jpg
  • Related Link - https://www.cleantechnology.co.jp/product/p1/

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basic information

〇 Device dimensions: (L) 4000 × (W) 3600 mm       Substrate size: (W) 2850 × (L) 3050 compatible             Additionally, compatible with various generations. 〇 Processing temperature: [Heating] 23℃ → 90℃ to 150℃ (up to Max 240℃)       [Cooling] 150℃ → 23℃ 〇 Precision temperature control: 23℃ ± 0.1℃ 〇 Transport method: Received and delivered by robot *For details, please request materials or view the PDF data from the download.

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【Usage】 〇 Color filters for LCDs 〇 Production lines for large substrates such as PDPs

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クリーン・テクノロジー

クリーン・テクノロジー

Industrial Machinery

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Aiming to become a technology development company, we are focusing our efforts to solidify our position in the LCD and semiconductor markets. With a proper understanding of market needs and responsiveness, we will provide products that meet our customers' demands. Additionally, we aim to develop environmentally related products for future business and strive to build a system that contributes to society.

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