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  3. 栗田製作所 本社・京都事業部
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栗田製作所 本社・京都事業部

addressKyoto/Ujitawara-cho, Tsuzuki-gun/1-33 Tōyadani Nishitōgaya, Ujitawara Industrial Park
phone0774-88-4811
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last updated:Jul 15, 2016
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栗田製作所 List of Products and Services

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Power products Power products
Plasma application products Plasma application products
Surface treatment products Surface treatment products
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Liquid Plasma Technology

Nitrogen nitrate aqueous solution as plant fertilizer! Technology to generate corona discharge in the liquid.

Kurita Manufacturing Co., Ltd.'s "Liquid Plasma Technology" is a technique that generates corona discharge and glow discharge in liquid rather than in a vacuum or atmosphere. By utilizing reactive species (H radicals, OH radicals) and ultraviolet light generated from the plasma, it enables high-speed processing of targets at the gas-liquid interface. By treating CNTs and modifying their surface with hydrophilic groups, it can improve their dispersibility in water. When treating a gold chloride aqueous solution, gold nanoparticles can be synthesized through a reduction reaction. 【Contents of Liquid Plasma Technology】 ■ CNT Dispersion ■ Nanoparticle Synthesis ■ Decolorization ■ Development of Multi-channel Systems For more details, please refer to the catalog or feel free to contact us.

  • Electric discharge machine
  • Plasma Generator
  • Plasma surface treatment equipment

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DLC film deposition device "Plasma Ion Injection Film Deposition Device"

3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.

The "Plasma Ion Injection Film Deposition Device" employs proprietary technology and is a DLC film deposition device capable of three-dimensional, large-scale, and low-temperature processing. It is a uniquely developed device by Kurita Seisakusho and has obtained a patent (Patent No. 3555928). By supplying the output of the pulse RF power source for plasma generation and the high-voltage pulse power source for ion injection from a single electrode, it enables plasma generation tailored to the substrate shape. DLC coating and gas ion injection processing can be performed with this single device. 【Features】 - Capable of three-dimensional shape film deposition - Can accommodate larger devices - Capable of low-temperature processing - Fully automated operation - Reliable log function For more details, please contact us or download the catalog.

  • Plasma surface treatment equipment

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DLC Film Contract Processing Service PEKURIS COAT

We offer the optimal coating film from a wide range of options.

PEKURIS COAT is a general term for the DLC coating by Kurita Manufacturing. We provide the optimal coating film from a wide range of lineups. PEKURIS COAT can perform coating on workpieces (substrates) under optimal conditions according to their intended use. The substrates that can be processed include not only iron-based metals but also low-melting-point metals such as stainless steel and aluminum, as well as a wide variety of materials like titanium. It is also possible to process insulators such as resins, rubber, glass, and ceramics. Additionally, we accept prototype processing for the development of applications other than these. For more details, please contact us or refer to our catalog.

  • Surface treatment contract service

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Plasma Ion Injection Film Deposition Device PBII-R1000

It can also be used as a production machine and is adopted by many users.

The Plasma Based Ion Implantation & Deposition (PBII&D) is a completely new plasma ion implantation technology developed in collaboration with Kurita Manufacturing Co., Ltd. and the Kansai Center of the National Institute of Advanced Industrial Science and Technology, and it has been patented (Patent No. 3555928). DLC coating is also possible. Due to its ease of handling, it can be used as a production machine and has been adopted by many users. For more details, please contact us or refer to the catalog.

  • Plasma surface treatment equipment
  • Ion implantation equipment

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Liquid Pulse Plasma Generation Power Supply MPP-HV04

The solution plasma experiment is surprisingly easy on the tabletop!

The liquid plasma generation device is compact and allows for easy experimentation with solution plasma. It generates plasma in liquid, enabling the synthesis of new materials and the creation of processing environments, representing a new plasma application technology. Various effects are demonstrated, such as the generation of nanoparticles and the imparting of water solubility to carbon nanotubes. Discharge is sustained through secondary electrons from the liquid and the coupling reactions between plasma and liquid. Additionally, because the discharge occurs in liquid, it is also possible to utilize the chemical reactivity of the liquid used. As it employs pulsed glow discharge, treatment can be performed at low temperatures. Compared to arc discharge, electrode damage is significantly reduced, allowing for prolonged operation. The generation of solution plasma uses a pulsed power supply, and by adjusting the conductivity of the liquid and the distance between electrodes, solution plasma can be generated with very low energy (a few hundred watts). For more details, please contact us or refer to the catalog.

  • Plasma Generator
  • Power Supplies

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Power supply product high-voltage pulse power supply

We have a variety of power supplies available for use under all load conditions.

The high-voltage pulse power supply uses robust vacuum tubes, making it highly durable even during load short circuits. It is capable of fast rise times and micro pulses. The pulse width and repetition frequency can be varied, allowing for easy adjustment according to application needs. We offer power supplies that can be used under all load conditions, including atmospheric pressure, vacuum, and in liquids. For more details, please contact us or refer to the catalog.

  • Power Supplies
  • power supply

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DLC Coating Process - PEKURIS COAT

With a unique three-dimensional film formation technology, we turn the impossible into reality.

The PEKURIS COAT is a film deposition device developed independently by Kurita Manufacturing Co., Ltd., which uses plasma ion implantation for film formation. By introducing gas into a vacuum and applying pulse RF and high-voltage pulses to the substrate itself, it is possible to generate plasma in a manner that follows the shape of the workpiece (substrate). Additionally, because it utilizes a pulse power supply, processing at low temperatures starting from 40°C is also possible. For more details, please contact us or refer to the catalog.

  • Surface treatment contract service

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Copper plate for returns

For the output return line of the pulse power, Kurita Manufacturing proposes a copper flat plate.

- It has a large surface area and good high-frequency characteristics. - It can be used as a substitute for output cables, minimizing inductance. - It can be used as a simple shield for EMC. - With a thickness of 0.2mm, it can be easily bent and can also be cut with metal scissors.

  • CVD Equipment
  • Ion implantation equipment
  • power supply

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DC power supply

It is a DC (charging) power supply capable of stable discharge through skilled return technology.

- Equipped with internal protection function to quickly stop output during load short-circuit. - Achieves fast rise time and short pulse width.

  • Other power sources
  • Other process controls
  • CVD Equipment

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High voltage probe

This is a probe ideal for high voltage measurement.

DC 10kV to 200kV, and a new dedicated model for 13.56MHz measurement has also been added to the lineup.

  • Plasma Generator
  • Electrical Instruments/Electrometers
  • power supply

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Plasma Ion Injection Film Formation Device

This is a completely new DLC coating device from Japan that also allows for gas ion injection.

- It is easy to manufacture large vacuum devices, and we have a track record of delivering large devices with a maximum length of 4m and a diameter of 1.2m. - Cost reduction is possible due to fully automated operation. - In addition to DLC film deposition, simple ion implantation is also possible, enabling the development of new materials. - Since a rotation and revolution mechanism and heater are not required, it is possible to minimize the generation of particles within the vacuum device.

  • Plasma Generator
  • CVD Equipment
  • Plasma surface treatment equipment

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Pulse power supply (vacuum tube switch method)

This is a pulse power supply that uses a vacuum tube capable of stable discharge.

Due to the use of highly durable vacuum tubes, there is no risk of power supply damage even in the event of overcurrent. This is a pulse power supply that uses vacuum tubes capable of stable discharge.

  • Plasma Generator
  • Ion implantation equipment
  • power supply

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Diamond-like carbon (DLC) coating process

Wide compatibility from metals to resins. Suitable for improving wear resistance of molds and sliding parts. Also ideal as an alternative to plating.

The "PEKURIS COAT" is a coating process that uses our proprietary plasma ion injection film deposition equipment to form a DLC film with excellent lubricity on the workpiece. Thanks to the ion injection effect, high adhesion film formation is easy, and it can be applied to materials such as stainless steel, tool steel, and aluminum alloys. Additionally, it allows for processing at low temperatures, making it compatible with low melting point resins, rubber, and aluminum. If you are facing issues with DLC coating, please feel free to contact us. 【Features】 ■ DLC film with excellent lubricity and low friction coefficient ■ Ultra-low stress DLC film allows for thick coatings ■ No restrictions on workpiece shape ■ Widely applicable to jigs, molds, sealing materials, and more *For more details, please refer to the documentation.

  • others
  • Surface treatment contract service
  • Other metal materials

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Pulse power supply

Achieving stable pulse discharge.

This is a pulse power supply optimal for pulsing bias power.

  • Plasma Generator
  • CVD Equipment
  • power supply

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Bipolar pulse power supply (vacuum tube switch method)

Achieving stable discharge in vacuum tubes.

Both poles use vacuum tubes, allowing for stable plasma generation.

  • Plasma Generator
  • Ion implantation equipment
  • power supply

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Atmospheric pressure plasma generation power supply

Generation of atmospheric pressure plasma by pulse discharge.

- We are collaborating with universities from various fields and have achieved many results. - We also accept custom orders tailored to specific applications.

  • Plasma Generator
  • Other semiconductor manufacturing equipment
  • Other metal materials

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