3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.
The "Plasma Ion Injection Film Deposition Device" employs proprietary technology and is a DLC film deposition device capable of three-dimensional, large-scale, and low-temperature processing. It is a uniquely developed device by Kurita Seisakusho and has obtained a patent (Patent No. 3555928). By supplying the output of the pulse RF power source for plasma generation and the high-voltage pulse power source for ion injection from a single electrode, it enables plasma generation tailored to the substrate shape. DLC coating and gas ion injection processing can be performed with this single device. 【Features】 - Capable of three-dimensional shape film deposition - Can accommodate larger devices - Capable of low-temperature processing - Fully automated operation - Reliable log function For more details, please contact us or download the catalog.
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【Lineup】 ○PBll-C600 (R&D Medium Machine) → Compact size → Very short vacuum evacuation time, leading to reduced film formation time ○PBll-R1000 (Standard Machine) → Can also be used as a production machine ○PBll-R1500 (Standard Large Machine) → Large machine with five times the volume of R1000 → Capable of film formation on large and long workpieces with the same ease of use as R1000 ● For more details, please contact us or download the catalog.
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By applying the pulse power technology we have cultivated over many years, we will surely meet your company's needs with the development of various newly developed plasma control power supplies and surface treatment equipment.