Room temperature powder ALD device for all-solid-state battery materials and quantum dot powders.
CMP-400
It is said to be difficult in ALD, but film formation from powder is possible at low temperatures (room temperature to 100°C) and atmospheric pressure!
**Features** - Powder film formation using swirling flow under atmospheric pressure - Control of film thickness according to application - Film formation possible at extremely low temperatures (room temperature to 100°C) **Application Examples** - SiO and Al2O3 film formation on powder for all-solid-state batteries - Film formation on powders such as dielectric materials and magnetic materials - Quantum dot powders **Consultation for Film Formation and Test Coating Available** At Creative Coatings, we accept test coatings and sample creation. We listen to our customers' requests and can suggest suitable equipment, types of films, and film thicknesses. Please feel free to consult with us. ++++++++++++++++++++++++++++++ We provide next-generation vapor phase technology demanded by the times and environment. We contribute to technological innovation with our dual technology of ultra-low temperature high-density plasma ALD equipment for semiconductors and ultra-low temperature high-density plasma powder ALD film formation equipment.
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basic information
【Chamber Size】 φ400mm 【Film Deposition Specifications】 ・For film deposition on magnetic powders, all-solid-state batteries, metal fine particles, etc. Work Types: Magnetic powders, all-solid-state batteries (sulfide-based, oxide-based), metal fine particles, and others Work Size: Any shape is acceptable as long as it is φ100mm or larger 【Applicable Films】 SiO, Al2O3, etc. *Since we design and manufacture our own equipment, we can discuss chamber sizes and film deposition specifications. Please feel free to contact us.
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Applications/Examples of results
- SiO and Al2O3 film formation for all-solid-state battery powders - Battery raw material powders, magnetic powders - Quantum dot powder - Powders (QD powder, fluorescent powders, etc.)
Line up（2）
| Model number | overview |
|---|---|
| Ultra-low temperature high-density plasma powder ALD film deposition device CMP-200 | Chamber size: φ200mm, continuous film formation for powders under atmospheric pressure, suitable for experimental/research and development purposes. |
| Ultra-low temperature high-density plasma ALD device CMVA-500P | Chamber size: □500mm, low-temperature (room temperature) ALD device in vacuum, powder specifications for experimental/research and development purposes. |
Company information
One of the key technologies for achieving carbon neutrality is next-generation batteries, along with nanoscale functional particles with various capabilities, the proliferation of 5G and 6G communication systems and environmentally friendly vehicles, and the advancements in advanced driver-assistance systems (ADAS). There is a growing expectation for our coating technology in various fields of society, including passive components such as MLCCs, which require miniaturization and high reliability, high-quality healthcare through digital transformation (DX), and medical devices advancing with AI and digitalization.
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