Compatible with high aspect ratio TGV/TSV. The world's largest chamber size (1000mm□) for ALD.
【Features】 ● Film formation at extremely low temperatures (room temperature to 100℃) Compatible with substrates and devices that have weak thermal resistance. ● Uniformity and density of the film Enables uniform and dense film formation even within fine structures and high aspect ratio holes. 【Applications】 - Capable of large area coverage - Film formation possible on high aspect ratio TGV/TSV - Film formation possible for SAW filters, solar cells, and other electronic component devices - Thin film deposition possible for delicate and complex 3D structures such as CPO (Co-Packaged Optics) - Support from R&D to production 【Consultation for film formation and test deposition available】 Creative Coatings offers test deposition and sample creation services. We can listen to your requirements and suggest suitable equipment, film types, and thicknesses. Please feel free to consult with us first.
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basic information
【Chamber Size】 □1000mm 【Film Deposition Specifications】 ・For film deposition on organic materials, etc. Work types: wafers, metals (SUS, aluminum, copper, etc.), resins, films, and others Work size: Any shape is acceptable if one side is approximately 100mm ・For film deposition on magnetic powders, all-solid batteries, metal nanoparticles, etc. Work types: magnetic powders, all-solid batteries (sulfide-based, oxide-based), metal nanoparticles, and others Work size: Any shape is acceptable if the diameter is 100mm or more 【Applicable Films】 SiO₂, Al₂O₃, TiO₂, ZrO₂, HfO₂, etc. *Since we design and manufacture our own equipment, we can discuss chamber sizes and film deposition specifications. Please feel free to contact us.
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Applications/Examples of results
Semiconductors, displays, optical coatings, energy fields, medical device fields, etc., are optimal for materials sensitive to heat and complex shapes. 【Semiconductor/Battery/Materials Field】 - High-quality thin film deposition for semiconductor devices - Uniform film deposition for high aspect TGV (Through Glass Via) and TSV (Through Silicon Via) - Dense and high-density film deposition for SAW filters (Surface Acoustic Wave filters) - Uniform film deposition for functional layers for CPO (Co-Packaged Optics) and complex 3D shapes - Thin film deposition for solar cells and fuel cells - Film deposition for battery materials such as lithium-ion and vanadium oxide 【Medical Field】 - Coating for heat-sensitive biomedical devices - Barrier films for implants and biosensors 【Industrial Products】 - Surface treatment for painting (surface modification coating) - Anti-corrosion coating for metal piping components 【Others】 - Insulating films, barrier films, protective films - Anti-reflective coatings (AR coatings) - Optical coatings - Formation of precise multilayer films - Uniform film deposition for fine pores and complex 3D shapes - Uniform film deposition for powders and more.
Line up（2）
| Model number | overview |
|---|---|
| Low-temperature (room temperature) ALD device CMVA-500 | Chamber size: □500mm, capable of film formation for various powders (more suited for mass production), can form films for high aspect ratio TGV/TSV. |
| Low-temperature (room temperature) ALD device CMVA-300 | Chamber size: □300mm, capable of coating various powders, suitable for high aspect TGV/TSV coating, ideal for R&D use. |
Company information
One of the key technologies for achieving carbon neutrality is next-generation batteries, along with nanoscale functional particles with various capabilities, the proliferation of 5G and 6G communication systems and environmentally friendly vehicles, and the advancements in advanced driver-assistance systems (ADAS). There is a growing expectation for our coating technology in various fields of society, including passive components such as MLCCs, which require miniaturization and high reliability, high-quality healthcare through digital transformation (DX), and medical devices advancing with AI and digitalization.
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