Developing device - Company Ranking(20 companyies in total)
Last Updated： Aggregation Period:Jul 30, 2025〜Aug 26, 2025
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Main Specifications】 ■ Cassette Stage: 2 sets ■ Spin Coating Unit: 1 set ■ Spin Development Unit: 1 set ■ Wafer Size: Φ2" to Φ12" ■ Resist Dropping Nozzle: 1 set ■ Back Edge Rinse: 1 set / Coating CUP ■ Development Nozzle: 1 set ■ Rinse Nozzle: 1 set ■ Bake Unit: 3 sets (Max 200℃) ■ Cooling Unit: 1 set ■ Centering Unit: 1 set ■ Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) ■ Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please refer to the PDF document or feel free to contact us. | For more details, please refer to the PDF document or feel free to contact us. | ||
| 【Main Specifications】 ■ Cassette Stage: 2 sets ■ Spin Development Unit: 2 sets ■ Wafer Size: Φ2" to Φ12" ■ Development Nozzle: 1 set/CUP ■ Rinse Nozzle: 1 set/CUP ■ Bake Unit: 4 sets (Max 200℃) ■ Cooling Unit: 2 sets ■ Centering Unit: 1 set ■ Equipment Size: (Example) 1400×1100×1800 (Φ4" main body) 400×900×1800 (Chemical supply + Power BOX) ■ Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please feel free to contact us. | We have a track record of sales in power devices, SAW filters, LEDs, LDs, and communication-related fields. | ||
| **Main Specifications** - Cassette Stage: 2 sets - Spin Development Unit: 2 sets - Wafer Size: Φ2" to Φ12" - Development Nozzle: 1 set/CUP - Rinse Nozzle: 1 set/CUP - Bake Unit: 2 sets (Max 200℃) - Cooling Unit: 1 set - Centering Unit: 1 set - UV Exposure Unit (LED light source is also available) - Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) - Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please refer to the PDF document or feel free to contact us.* | For more details, please refer to the PDF document or feel free to contact us. | ||
|
---
--- |
--- | ||
エイ・エス・エイ・ピイ
-
- Featured Products
-
Automatic photoresist coating and developing equipment (coater-developer)
- overview
- 【Main Specifications】 ■ Cassette Stage: 2 sets ■ Spin Coating Unit: 1 set ■ Spin Development Unit: 1 set ■ Wafer Size: Φ2" to Φ12" ■ Resist Dropping Nozzle: 1 set ■ Back Edge Rinse: 1 set / Coating CUP ■ Development Nozzle: 1 set ■ Rinse Nozzle: 1 set ■ Bake Unit: 3 sets (Max 200℃) ■ Cooling Unit: 1 set ■ Centering Unit: 1 set ■ Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) ■ Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please refer to the PDF document or feel free to contact us.
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
Static development type (paddle) automatic photoresist development device (developer)
- overview
- 【Main Specifications】 ■ Cassette Stage: 2 sets ■ Spin Development Unit: 2 sets ■ Wafer Size: Φ2" to Φ12" ■ Development Nozzle: 1 set/CUP ■ Rinse Nozzle: 1 set/CUP ■ Bake Unit: 4 sets (Max 200℃) ■ Cooling Unit: 2 sets ■ Centering Unit: 1 set ■ Equipment Size: (Example) 1400×1100×1800 (Φ4" main body) 400×900×1800 (Chemical supply + Power BOX) ■ Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please feel free to contact us.
- Application/Performance example
- We have a track record of sales in power devices, SAW filters, LEDs, LDs, and communication-related fields.
Liftoff (Image Reversal) Compatible Photoresist Development Equipment
- overview
- **Main Specifications** - Cassette Stage: 2 sets - Spin Development Unit: 2 sets - Wafer Size: Φ2" to Φ12" - Development Nozzle: 1 set/CUP - Rinse Nozzle: 1 set/CUP - Bake Unit: 2 sets (Max 200℃) - Cooling Unit: 1 set - Centering Unit: 1 set - UV Exposure Unit (LED light source is also available) - Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) - Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please refer to the PDF document or feel free to contact us.*
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
-
エイ・エス・エイ・ピイ
Membership (free) is required to view all content.
Already a Member? Log In Here
