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  3. ウシオ電機
  4. We will be exhibiting at SEMICON Japan 2024.
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  • Aug 24, 2024
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Aug 24, 2024

We will be exhibiting at SEMICON Japan 2024.

ウシオ電機 ウシオ電機
Our company will be exhibiting at SEMICON Japan 2024, which will be held at Tokyo Big Sight from December 11 (Wednesday) to December 13 (Friday). As in previous years, we will be showcasing various optical heating products, and we look forward to your visit.
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Third light heating source! LED annealing device

Improved heating efficiency for energy savings! Achieving reduced thermal budget with high responsiveness.

The "LED Annealing Device" is the third light heating source following halogen heaters and flash lamps. It achieves energy savings through improved heating efficiency and reduces thermal budget with high-speed responsiveness. Real-time temperature measurement using a radiation thermometer is possible. Additionally, it can heat the surface of substrates and demonstrates excellent heating efficiency for metal materials. 【Features】 ■ Improved heating efficiency ■ High-speed responsiveness ■ High-precision temperature measurement ■ High uniformity ■ Capable of heating substrate surfaces *For more details, please refer to the PDF materials or feel free to contact us.

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Flash Lamp Annealing Device "SUS980 Series"

Depending on the work size, multiple flash lamps can be arranged! Large area simultaneous irradiation and high-intensity irradiation are possible!

The "SUS980 Series" is a flash lamp annealing device that can be used for applications such as crystallization, peeling, and oxide film formation. By controlling the current flowing through the lamp with a semiconductor switch to turn it ON/OFF, the pulse width of the lamp current can be adjusted, allowing for control of the heating depth (0.1 to 60 msec). Depending on the work size, multiple flash lamps can be arranged for large area irradiation, enabling high irradiation. 【Features】 ■ Depth control (pulse control) ■ ON/OFF control of the current flowing through the lamp using a semiconductor switch ■ Adjustable lamp current pulse width for controlling heating depth (0.1 to 60 msec) ■ Multiple pulse irradiation is also possible ■ High output and large area processing (shortened tact time, high uniformity) *For more details, please refer to the PDF document or feel free to contact us.

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Direct heating is possible! Straight tube double tube halogen heater lamp QIRT

Ideal for heating food such as fryers! Double tube heater lamp with enhanced airtightness.

The "Straight Tube Double Tube Halogen Heater Lamp QIRT" is a lamp that can directly heat liquids such as water, chemicals, and oil by enhancing airtightness through its double tube structure. Additionally, the double tube structure increases safety by preventing scattering in the event of lamp breakage, making it suitable as a heat source for food heating applications such as fryers. In the custom-made system, it can be designed according to any dimensions, wavelengths, installation conditions, and characteristics. 【Lineup】 ■QIRT100V500W ■QIRT100V700W ■QIRT200V2000W ■QIRT200V2000WL *For more details, please refer to the PDF materials or feel free to contact us.

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Line heating and heating over large areas are highly effective! Line heater unit.

Selectable based on the shape of the heating target and the irradiation range! Introduction of the heater unit.

The "Line Heater Unit" combines a heater lamp and a mirror, demonstrating its effectiveness in line heating and heating large areas. By narrowing down the dimensions and characteristics for standardization, it offers high cost performance, making it easy to introduce for prototype verification and experiments. Additionally, we also accommodate custom orders tailored to the required specifications. Please feel free to contact us when needed. 【Features】 ■ Combines a heater lamp and a mirror, demonstrating effectiveness in line heating and heating large areas ■ Standardized by narrowing down dimensions and characteristics ■ High cost performance ■ Easy to introduce for prototype verification and experiments ■ Accommodates custom orders tailored to required specifications *For more details, please refer to the PDF document or feel free to contact us.

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High-temperature range exceeding 500℃! High-output line heater unit.

Select lamps, mirror shapes, and cooling methods tailored to the user's required temperature, output, dimensions, and other characteristics!

The "High Power Line Heater Unit (Custom Made)" is a high-output product that enables light control in high-temperature ranges exceeding 500°C. We select lamps, mirror shapes, and cooling methods tailored to the user's desired temperature, output, and dimensions, providing a completely custom-made solution. Mirror shapes available include the focus type, parabolic type P, and parabolic type N (compact type with gold-plated mirror specifications). 【Features】 ■ High-output line heater unit that enables light control in high-temperature ranges exceeding 500°C ■ Completely custom-made solutions by selecting lamps, mirror shapes, and cooling methods tailored to specific characteristics ■ Available in focus type, parabolic type P, and parabolic type N ■ Parabolic type can uniformly irradiate a wide area *For more details, please refer to the PDF document or feel free to contact us.

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Light Heating Comprehensive Catalog

High-efficiency energy source! Introducing light heating products such as infrared halogen heaters.

This catalog features light heating products centered around infrared halogen heaters. We offer a lineup that includes the straight tube halogen heater lamp "QIR," which can heat a wide area uniformly, and the circle-shaped halogen heater lamp "QIR Circle," suitable for high-temperature heating devices for silicon wafers. Additionally, we also introduce the "Flash Lamp Annealing Device SUS980 Series" and "LED Annealing Device." [Contents (partial)] ■ What is light heating? ■ Infrared halogen heaters ■ Applications of infrared halogen heaters ■ Types and special processing of infrared halogen heaters ■ Straight tube halogen heater lamp QIR *For more details, please refer to the PDF document or feel free to contact us.

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Light Application Heating Device "Flash Lamp Annealing Device"

A heating device capable of large-area simultaneous irradiation and high-intensity irradiation! It can also perform multiple pulse irradiations.

The "Flash Lamp Annealing Device" is a light-based heating device that instantly anneals objects within one second. Using the light from a xenon flash lamp that has a continuous wavelength range from UV to visible and infrared, it can be variably adjusted within a range of 0.1 to 60 milliseconds. It can be used for a variety of applications utilizing a wide spectrum, such as sintering, peeling, and surface modification. 【Features】 ■ Spectrum - Wide wavelength characteristics from ultraviolet to visible and infrared regions ■ High output and large area processing (shortened tact time, high uniformity) - Multiple flash lamps can be arranged according to the work size, allowing for large area simultaneous irradiation with high intensity (Max 70 J/cm²). *For more details, please refer to the PDF materials or feel free to contact us.

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Circle-shaped halogen heater lamp QIR Circle

Processing compatible with vacuum is possible! It can be utilized when heating is required for circular shapes or within a circular range!

The "QIR Circle Halogen Heater Lamp" is a circular lamp suitable for high-temperature heating devices such as silicon wafer heaters. It can be utilized when heating in a circular shape or within a circular range is required. Custom designs can be made according to desired sizes and characteristics, and processing for vacuum compatibility is also possible. In the custom-made system, any dimensions, wavelengths, installation conditions, and characteristics can be designed up to a maximum circle diameter of 500mm. 【Features】 ■ A circular lamp suitable for high-temperature heating devices such as silicon wafer heaters ■ Can be utilized when heating in a circular shape or within a circular range is required ■ Custom designs can be made according to desired sizes and characteristics, and processing for vacuum compatibility is also possible ■ Can be designed for any dimensions, wavelengths, installation conditions, and characteristics up to a maximum circle diameter of 500mm *For more details, please refer to the PDF document or feel free to contact us.

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[Case Study] Insulation and Heating of Liquids

[Case Study] Insulation and Heating of Liquids

This is an introduction to examples of liquid temperature maintenance and overheating using Ushio's light source for thermal heating, which has a tradition and a wealth of achievements. 【Features】 ○ Capable of maintaining temperature and humidifying pure water and chemical solutions used for cleaning silicon wafers in semiconductor manufacturing lines and glass substrates in LCD manufacturing lines. ○ Composed of halogen lamps covered with high-quality quartz glass, resulting in minimal impurity contamination and the ability to heat efficiently with an efficiency of over 95%. ● For other functions and details, please contact us.

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[Case Study] Preheating of Film Deposition Equipment

[Case Study] Preheating of Film Formation Equipment

This is a case study of a preheating system for a film deposition device using light sources for light heating from Ushio, a company with a wealth of experience and achievements. By using a halogen lamp heater that has non-contact and high-speed heating capabilities even in a vacuum environment, we can contribute to reducing the takt time in the film deposition processes for semiconductors, FPDs, solar cells, and more. ● For other functions and details, please contact us.

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[Case Study] RTP (Rapid Thermal Process)

[Case Study] RTP (Rapid Thermal Process)

This is a case study of RTP using light sources for light heating from Ushio, a company with tradition and a wealth of achievements. In the past, semiconductor thermal processing commonly used furnaces (insulated), but for nano-order devices, thin film formation and shallow junctions are required, making RTP, which is synonymous with isothermal processes, a key technology. Additionally, in next-generation semiconductors, flash lamp annealing has become the mainstream technology as a thermal flux technique. ● For other functions and details, please contact us.

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What can be done with Ushio's light: Heating "Joining"

What can be done with Ushio's light: Heating "Joining"

This is an introduction to practical examples (joining) of Ushio's light sources for light heating, which has a tradition and a wealth of achievements. 【Features】 ○ Light source used: Halogen lamp heater ○ Halogen heaters are used for the welding of various heat sink pipes ○ The light from halogen heaters is emitted as radiant heat, making it less affected by the surrounding environment compared to hot air types, and capable of reaching the desired temperature in a short time ○ Unlike heating with gas burners, it is suitable for reducing CO2 environmental impact ● For other functions and details, please contact us.

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What can be done with Ushio's light: "Impurity Diffusion"

What can be done with Ushio's light: "Impurity Diffusion"

This is an introduction to practical examples of Ushio's light sources for optical heating, which have a solid and abundant track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamp, halogen heater lamp ○ In the semiconductor process, implantation is performed on the source drain, followed by an annealing process to activate the doped impurities. ○ Utilizing the characteristics of the xenon flash lamp, it is possible to perform high-temperature annealing in a very short time frame measured in milliseconds, allowing for extremely shallow areas (on the order of nm) compared to the depth of the previous active layer, thus preventing impurity diffusion. ● For other functions and details, please contact us.

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What can be done with Ushio's light: "Heating / Film Formation"

What can be done with Ushio's light: "Heating/Film Formation"

This is an introduction to practical examples of Ushio's light sources for light heating (heating/thin film deposition), which has a tradition and a wealth of achievements. 【Features】 ○ Light source used: Halogen lamp heater ○ Optimal as a heat source for CVD and sputtering equipment used in the manufacturing processes of semiconductors, FPDs, and solar cells for the formation of metal films and insulating films. ○ Additionally, by using halogen lamp heaters for moisture removal and preheating before film deposition, it achieves improved throughput and high-quality film formation. ● For other functions and details, please contact us.

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Ideal for heating silicon wafers and glass lenses! Circle heater unit.

Designed through 3D reflective light simulation! Excellent heating uniformity and temperature rise performance.

The "Circle Heater Unit" is a product that is particularly suitable for rapid heating of silicon wafers and pre-heating of glass lenses before molding. The reflector and lamp, designed through 3D reflection light simulation, are appropriately arranged. It has excellent heating uniformity and temperature rise performance. Please feel free to contact us when you need assistance. 【UL-HU-CH36KW/STD Specifications (Excerpt)】 ■ Rated Voltage: 200V ■ Power Consumption: 36kW ■ Unit Outer Diameter: 470mm ■ Unit Depth: 235.5mm ■ Weight: 30kg *For more details, please refer to the PDF document or feel free to contact us.

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Related catalog(5)

Light Heating Comprehensive Catalog

Light Heating Comprehensive Catalog

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Light Application Heating Device "Flash Lamp Annealing Device"

Light Application Heating Device "Flash Lamp Annealing Device"

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Halogen heater unit

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Halogen lamp heater

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LED Annealing Catalog

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【Metal Crack Repair】We repair cracks in metal products without applying heat.

  • NEW
  • CATALOG

The "Mechanical Stitch Method" by Nichinichisui Road Machinery Co., Ltd. is a new technique that allows for the repair of metal cracks without the application of heat. By using special bolts and reinforcement plates, cracks are physically removed, and repairs are made without causing any thermal impact to the base material. Repairs can be carried out in environments where open flames cannot be used. Since no heat is applied, the disassembly of equipment is minimized. ◎ For more details, please contact us. ◎ If a detailed technical explanation is needed, please contact us.

Mar 20, 2026

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Aluminum casting repair: Metal crack repair without applying heat.

  • NEW
  • PRODUCT

The "Mechanical Stitching Method" by Nichinichisui Road Machinery Co., Ltd. is a new technique that allows for the repair of metal cracks without the application of heat. By using special bolts and reinforcement plates, cracks are physically removed, and repairs are made without causing any thermal impact on the base material. Repairs can be carried out in environments where open flames cannot be used. Since no heat is applied, the disassembly of equipment is minimized. ◎ For more details, please contact us. ◎ If a detailed technical explanation is needed, please contact us.

Mar 20, 2026

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AAEON ArrowLake equipped industrial COM module Type 6 standard

  • NEW
  • PRODUCT

Features: ● Equipped with Intel Core Ultra 7 255H/7 155H/5 225H/5 125H ● LPDDR5x 16GB/32GB/64GB onboard ● M.2 NVMe 256GB onboard ● USB 2.0 x 8, USB 3.2 (10Gbps) x 4 ● PCIe Gen 4 [x8] x 1, PCIe Gen 3 [x1] x 4, PCIe Gen 3 [x4] x 1 (2 lanes co-lay with SATA; BOM option) ● 2.5GbE x 2 ● COM-HPC Mini standard, size 95mm x 70mm ● Optional items ECB-980A: Development carrier board HPC-ARHm-FAN01: CPU fan HPC-ARHm-HSP01: Heat spreader (Note: heat dissipation is required in the enclosure)

Mar 19, 2026

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AAEON ArrowLake-equipped industrial COM module COM-HPC R1.2 Mini standard

  • NEW
  • PRODUCT

Features: ● Equipped with Jetson AGX Orin 32GB/64GB ● Gigabit LAN ×1, 10Gigabit LAN ×1 ● USB 3.2 Gen 2 (Type-A) ×4 ● DB-9 connector ×1 (for DIO 8 channels) ● DB-9 connector ×2 (supports RS-232/422/485: Rx/Tx/RTS/CTS) ● Jetpack 6.0.0 pre-installed

Mar 19, 2026

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AAEON Amston Lake equipped industrial COM module NANOCOM-ASL Type 10 standard

  • NEW
  • PRODUCT

Features: ● Equipped with Intel Atom x7835RE/x7433RE ● LPDDR5x 8GB/16GB onboard ● eMMC 32GB/64GB onboard ● LVDS x 1, DDI x 1 ● USB 2.0 x 8, USB 3.2 Gen 2 x 2 ● PCIe x1 x 4 ● COMe Type 10 standard, 84mm x 55mm size ● Operating temperature -40 to 85℃ ● Optional items ECB-920A-0001: Development carrier board NANOCOM-ADN-FAN01: CPU fan NANOCOM-ADN-HSP01: Heat spreader (※ Heat dissipation is required in the enclosure)

Mar 19, 2026

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