Depending on the work size, multiple flash lamps can be arranged! Large area simultaneous irradiation and high-intensity irradiation are possible!
The "SUS980 Series" is a flash lamp annealing device that can be used for applications such as crystallization, peeling, and oxide film formation. By controlling the current flowing through the lamp with a semiconductor switch to turn it ON/OFF, the pulse width of the lamp current can be adjusted, allowing for control of the heating depth (0.1 to 60 msec). Depending on the work size, multiple flash lamps can be arranged for large area irradiation, enabling high irradiation. 【Features】 ■ Depth control (pulse control) ■ ON/OFF control of the current flowing through the lamp using a semiconductor switch ■ Adjustable lamp current pulse width for controlling heating depth (0.1 to 60 msec) ■ Multiple pulse irradiation is also possible ■ High output and large area processing (shortened tact time, high uniformity) *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications (Excerpt)】 <For Experiments / Large Area> ■Irradiation Area (mm): 100×150 / 500×500 ■Irradiation Energy (J/cm²): up to 40 / up to 4 ■Uniformity (%): 75 or more / 90 or more ■Pulse Width Setting Range (msec): 1 to 60 ■Emission Cycle (sec): 60 or more / 6.5 or more *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■ Crystallization ■ Peeling ■ Oxide film formation ■ Sintering ■ Adhesion *For more details, please refer to the PDF document or feel free to contact us.
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Heating, hardening, cleaning, modification, surface treatment, adhesion, exposure, lighting, treatment, measurement, testing... When it comes to "light," leave it to Ushio. From light sources to units and light devices, we propose the optimal "light" tailored to your goals and applications with our unique light technology (we also offer joint experiments, joint research, and lending of demo and experimental equipment).