Processing of GaN substrates is also possible! Introduction of contact annealing lamp annealing (RTP) equipment.
The "RLA-3100-V" is a contact annealing lamp annealing (RTP) device that can accommodate a wide range of wafer sizes up to 6 inches. It features a vacuum-designed quartz tube that allows for a clean vacuum (LP) environment and processing in an N2 load lock atmosphere. Additionally, it is equipped with an automatic wafer exchange mechanism, enabling C to C transport. 【Features】 ■ Supports a wide range of wafer sizes up to 6 inches ■ Equipped with an automatic wafer exchange mechanism for C to C transport ■ Improved annealing characteristics due to vacuum compatibility ■ Achieves short TAT with N2 load lock compatibility ■ Capable of processing GaN substrates *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications】 ■Operating temperature range: 600 to 1200℃ ■Wafer size: up to 6 inches ■Gases used: N2, Ar, O2, H2 *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Usage】 ■ Contact annealing, oxidation (processing under reduced pressure, processing in an N2 load lock environment is possible) *For more details, please refer to the PDF document or feel free to contact us.
Company information
JTEKT Thermo System started its business by manufacturing and selling heat treatment equipment for bearing materials. Since then, it has quickly responded to technological innovations and changes in industrial structures, and has been engaged in the development of various manufacturing equipment, not only for metals but also for semiconductors, electronic components, displays, and more.
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