Analysis Seminar: "Surface Analysis (XPS, TOF-SIMS)"
With the advancement of device miniaturization and the composite of different materials, controlling the surface and interface of materials is becoming increasingly important. To control the surface and interface of materials, it is necessary to selectively analyze regions smaller than a few nanometers that influence their properties, making it difficult to obtain useful information through conventional bulk analysis that targets the entire sample. Surface analysis is an analytical method developed to meet this demand, sensitive to regions from 10 nm to 1 nm in depth.
In this course, we will introduce the principles and characteristics of X-ray photoelectron spectroscopy (XPS / ESCA) and time-of-flight secondary ion mass spectrometry (TOF-SIMS), both widely used methods for analyzing surface composition, chemical structure, and functional groups, along with application examples of both techniques.

| Date and time | Thursday, May 21, 2026 01:00 PM ~ 04:00 PM |
|---|---|
| Entry fee | Charge 44,000 yen (including tax) |
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Details & Registration
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