[Free Seminar] June 12 (Friday) | Cutting-edge Semiconductor Plasma Atomic Layer Etching (ALE) Interpreted from Patent Information
In this seminar, we will provide an overview of the research and development trends related to ALE technologies based on the latest patent information. Rather than viewing it merely as equipment technology, we will explore:
- The processing requirements demanded by next-generation semiconductor processes
- New demands on materials and surface treatment technologies
- The trend of atomic-level control technologies expanding from ALD to ALE
- The ALE-related trends of equipment manufacturers that are leading in the ALD field
Through these topics, we will interpret future technological advancements and market opportunities.
Additionally, the technological development trends of equipment manufacturers that have been at the forefront in the ALD field, such as ASM International and Tokyo Electron, provide important insights into the changes in processing challenges and material requirements in next-generation semiconductor processes. This seminar will also consider the evolution direction of ALE technology and its potential impact on related markets, taking into account the patent application trends of these key players.
The content aims to provide hints for exploring research themes and discovering business opportunities in the next-generation semiconductor field, not only for equipment manufacturers but also for material manufacturers, chemical manufacturers, component manufacturers, and device manufacturers considering entry into the semiconductor market or application development, particularly for their research planning and technology strategy departments.

| Date and time | Friday, Jun 12, 2026 11:00 AM ~ 11:30 AM ZOOM Webinar |
|---|---|
| Entry fee | Free |
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