Announcement of the start of sales for the "Atmospheric Pressure Air Plasma Device" that requires no gases such as argon or nitrogen, by Well Corporation.
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Well Corporation has started selling an atmospheric air plasma device in Japan that generates ultra-high-density radicals using only air, without the need for gases such as argon or nitrogen. This device has already been delivered over 400 times in overseas markets.
Compared to conventional argon plasma devices, its main features are high-speed processing, low running costs, and damage-free plasma.
□ Features
- Ultra-high-density radical generation
- Potential-free plasma (can directly irradiate plasma onto fine wiring patterns)
- High-speed processing (3 to over 10 times faster than conventional methods)
- Low running costs (no need for argon or nitrogen gas, AC100V power supply)
□ Main Applications
- Wire bonding pre-treatment
- Semiconductor pad plating pre-treatment
- Die bonding pre-treatment
≪Inquiries regarding this matter≫
Well Corporation, Implementation Solutions Sales Department
2-2-25 Higashi-Shinagawa, Shinagawa-ku, Tokyo 140-0002, Sunwood Shinagawa Tennozu Tower 2F
Tel: 03-5715-3501
Fax: 03-5715-3502
info@welljp.co.jp
http://well-plasma.jp/
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