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  3. Scientific and Physics Equipment
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  5. Plasma surface treatment equipment
  6. Atmospheric Pressure Plasma Device MyPL-Auto Series

Atmospheric Pressure Plasma Device MyPL-Auto Series

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MyPL-Auto Series

last updated:Jun 17, 2011

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High-density plasma is generated over a large area by a unique reactor head!

Facilitating the construction of mass production inline systems for large workpieces such as semiconductor IC pad cleaning, FPC substrates, and LCD glass substrates, achieving reductions in capital investment and running costs!

    Molding EquipmentCircuit board processing machinePlasma surface treatment equipment
myplauto100.JPG

Atmospheric Pressure Plasma Device MyPL-Auto Series

myplauto100.JPG
myplauto100.JPG
  • Related Link - http://well-plasma.jp/mypl_auto.aspx

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basic information

Semi-automatic machine for cell production equipped with an automatic stage It can automatically modify the surface of workpieces up to 300x600mm in size. 【Main Features】 - Direct method using glow discharge plasma - Low running costs (gas consumption, low power) - Compatible with metals/non-metals (arc control)

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Applications/Examples of results

**Main Applications** ○ Semiconductor Market - Pre-treatment for die attach, molding, wire bonding, Au-Au ultrasonic bonding, etc. (Improvement of bondability) - Surface modification and organic material removal (wafers, glass, PCB/FPCB, CSP/BGA substrates, etc.) ○ LCD Market - Cleaning of LCD substrate terminals **Product Lineup** - Tabletop atmospheric pressure plasma surface modification device MyPL series - Tabletop semi-automatic atmospheric pressure plasma surface modification device MyPL-Auto series - Semi-automatic atmospheric pressure plasma surface modification device ILP-Auto series - Mass production inline atmospheric pressure plasma surface modification device ILP-Inline series - Atmospheric pressure plasma device IHP-1000

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Atmospheric pressure plasma surface modification device

Atmospheric pressure plasma surface modification device

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Atmospheric pressure air plasma device

Announcement of the start of sales for the "Atmospheric Pressure Air Plasma Device" that requires no gases such as argon or nitrogen, by Well Corporation.

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Well Corporation has started selling an atmospheric air plasma device in Japan that generates ultra-high-density radicals using only air, without the need for gases such as argon or nitrogen. This device has already been delivered over 400 times in overseas markets. Compared to conventional argon plasma devices, its main features are high-speed processing, low running costs, and damage-free plasma. □ Features - Ultra-high-density radical generation - Potential-free plasma (can directly irradiate plasma onto fine wiring patterns) - High-speed processing (3 to over 10 times faster than conventional methods) - Low running costs (no need for argon or nitrogen gas, AC100V power supply) □ Main Applications - Wire bonding pre-treatment - Semiconductor pad plating pre-treatment - Die bonding pre-treatment ≪Inquiries regarding this matter≫ Well Corporation, Implementation Solutions Sales Department 2-2-25 Higashi-Shinagawa, Shinagawa-ku, Tokyo 140-0002, Sunwood Shinagawa Tennozu Tower 2F Tel: 03-5715-3501 Fax: 03-5715-3502 info@welljp.co.jp http://well-plasma.jp/

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High-density radical atmospheric pressure plasma device

Notice of Participation in the 27th Advanced Implementation Technology and Packaging Exhibition (2013 Microelectronics Show)

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Well, Inc., a semiconductor advanced packaging solution provider specializing in test chips, will exhibit at the 27th Advanced Packaging Technology and Packaging Exhibition eX-tech2013, which will be held from June 5 (Wednesday) to June 7 (Friday), 2013, at Tokyo Big Sight. ■ Overview of the 27th Advanced Packaging Technology and Packaging Exhibition (eX-tech2013) [Dates] June 5 (Wednesday) to June 7 (Friday), 2013 - 3 days [Opening Hours] 10:00 AM to 5:00 PM [Venue] Tokyo Big Sight (3-21-1 Ariake, Koto-ku, Tokyo) [Booth] 3N-12 [Exhibit Contents] - High-density radical atmospheric pressure plasma equipment - TSV-equipped TEG chips for advanced packaging evaluation - TSV & MEMS processing services - Bump processing services ≪For inquiries regarding this matter≫ Well, Inc. Implementation Solutions Sales Department 2-2-25 Higashi-Shinagawa, Shinagawa-ku, Tokyo 140-0002, Sunwood Shinagawa Tennoz Tower 2F Tel: 03-5715-3501 Fax: 03-5715-3502 info@welljp.co.jp http://well-plasma.jp/

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Atmospheric pressure plasma device

Notice of Participation in the 22nd Fine Tech Japan - Low Power Atmospheric Pressure Plasma Device with Reduced Ozone and Nitrogen Oxide Emissions

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Well, Inc. (Location: Shinagawa, Tokyo; CEO: Naoyuki Eda), a provider of advanced semiconductor packaging solutions centered around test chips, will exhibit at the 22nd Fine Tech Japan, which will be held at Tokyo Big Sight from April 11 (Wednesday) to April 13 (Friday), 2012. Well's atmospheric pressure plasma equipment is characterized by its environmental friendliness, featuring low power consumption (CO2 reduction) while suppressing the generation of ozone and nitrogen oxides. Additionally, it does not require a vacuum chamber like conventional equipment, combining low capital investment with low running costs, which is its greatest economic advantage. On the day of the event, we will conduct a demonstration using the compact tabletop MyPL-Auto150, allowing you to experience actual large-area plasma irradiation. We sincerely look forward to your visit. 【Contact Information for Inquiries】 Well, Inc. Packaging Solutions Sales Department Tel: 03 (5715) 3501 Email: info@welljp.co.jp http://well-plasma.jp/

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Atmospheric pressure plasma device

Announcement of Participation in the 41st InterNepCon Japan - Low Power Atmospheric Pressure Plasma Device with Reduced Ozone and Nitrogen Oxide Emissions.

  • Campaign

Well, Inc. (Headquarters: Shinagawa, Tokyo; CEO: Naoyuki Eda), a provider of advanced semiconductor packaging solutions centered around test chips, will exhibit at the 41st InterNepcon Japan, which will be held at Tokyo Big Sight from January 18 (Wednesday) to January 20 (Friday), 2012. Well's atmospheric pressure plasma equipment is characterized by its environmental friendliness, featuring low power consumption (reducing CO2 emissions) while suppressing the generation of ozone and nitrogen oxides. Additionally, it does not require a vacuum chamber like conventional equipment, offering both low capital investment and low running costs, which are its greatest economic advantages. On the day of the event, we will conduct demonstrations using the compact tabletop MyPL-Auto150, allowing attendees to experience actual large-area plasma irradiation. We sincerely look forward to your visit. http://well-plasma.jp/news20111115.aspx 【Contact for inquiries】 Well, Inc. Packaging Solutions Sales Department tel: 03 (5715) 3501 mail: info@welljp.co.jp

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Electronic Components and Semiconductors

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Well develops and implements a packaging solution business centered on test chips for advanced implementation evaluation, covering everything from bare chip packaging equipment development and contract implementation to reliability evaluation. ~ Corporate Philosophy ~ ■ With "Profitable Relationship" as the core of our management philosophy, we aim to be a company that contributes to the prosperity of our customers and the development of the globally expanding electronics components industry. ■ Through the provision of products that support next-generation semiconductor packaging development, we contribute to the promotion of our customers' development and the enhancement of their profits. ■ We aim to create valuable markets by providing "innovative products" and "cutting-edge services."

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