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  3. NITTA DuPont Incorporated
  4. [Basic Knowledge] Processing Process of Silicon Wafers and Polishing Examples
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  • Jan 09, 2019
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Jan 09, 2019

[Basic Knowledge] Processing Process of Silicon Wafers and Polishing Examples

NITTA DuPont Incorporated NITTA DuPont Incorporated
Silicon wafers are an important material that serves as the supporting substrate for semiconductor integrated circuits such as ICs and LSIs. There is a polishing process in the manufacturing process. In this process, scratches and impurities formed on the wafer surface up to the previous step are removed, and the wafer is processed into a high-flatness wafer without distortion. Once finished in this process, the wafer achieves a completely distortion-free mirror-like surface. For more details, please refer to our corporate website via the URL link below. ■ Silicon Wafer Polishing Case Study Before CMP, the wafer is in the state where the rough polishing as "As Lapped" has been completed, with a surface roughness of Ra=1.57nm. Through multi-step CMP processing, the surface roughness is reduced to Ra=0.22nm. - Achieving nano-level surface roughness and mirror finish - Reduction of surface defects such as scratches and particles - Improved yield
Silicon wafer polishing case study
Silicon wafer polishing case study
Silicon wafer
Silicon wafer
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Manufacturing Process of Silicon Wafers and Polishing
This explains the overview of the manufacturing process of silicon wafers and the role of polishing in that process.

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EXTERION(TM)画像.jpg

Foam Polyurethane Pad "EXTERION(TM)"

Polishing pads optimal for primary polishing in mirror surface finishing.

The EXTERION(TM) series is a polyurethane foam pad created from advanced foam control technology. It is used for primary polishing of silicon wafers and compound substrates, providing a high-quality finish and reliable polishing performance. Additionally, its special processing technology demonstrates excellent thickness precision and startup performance.

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不織布パッド『SUBA』.JPG

Non-woven fabric pad "Suba(TM)"

A non-woven fabric-based polishing pad that responds well to various applications.

"Suba(TM)" is a polishing pad made from polyester fibers, with polyurethane impregnated into a non-woven fabric formed by a dry process. It demonstrates excellent performance primarily for primary and secondary polishing of silicon wafers, sapphire wafers, and oxide wafers. It can also be used for edge polishing and notch polishing, and offers a wide range of products tailored to each process. 【Features】 ■ High polishing rate ■ Low defect rate ■ High flatness *For more details, please refer to the catalog or feel free to contact us.

  • Wafer processing/polishing equipment
  • Hand polishing and filing
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H1000画像.png

Soft Pad "H1000"

Polishing pad for achieving defect-free finishes

The H1000 series pad was developed as a pad for final polishing of silicon wafers. Its unique resin design demonstrates excellent scratch performance, and the straight pore structure achieves high stability and long life.

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Nanopure(TM)画像.jpg

Precision Grinding Slurry "Nanopure(TM)"

Polishing slurry that achieves nano-level surface quality.

The Nanopure(TM) series is a polishing slurry primarily used for primary polishing, secondary polishing, finishing polishing, and edge polishing of silicon wafers. The abrasive particles are made of high-purity colloidal silica, achieving excellent polishing performance through an optimal blend of additives. We will propose the most suitable product lineup based on your objectives and applications.

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Related catalog(2)

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

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Nitta Dupont Co., Ltd. "CMP Polishing Slurry" Product Catalog

Nitta Dupont Co., Ltd. "CMP Polishing Slurry" Product Catalog

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