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  3. NITTA DuPont Incorporated
  4. [Technical Information] Groove Processing of CMP Polishing Pads 2
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  • Mar 07, 2019
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Mar 07, 2019

[Technical Information] Groove Processing of CMP Polishing Pads 2

NITTA DuPont Incorporated NITTA DuPont Incorporated
Last time, we explained how the groove processing on the surface of polishing pads affects the diffusion of slurry. Here, we will introduce examples that visually verify the diffusion effect of slurry due to grooves. We prepared six different types of groove processing as samples on the polishing pad "IC1000," which has become the de facto standard for semiconductor use. - Circular Groove - Perforated Groove - Radial Groove - Spiral Groove - XY Groove - Arc Groove When a blue-colored liquid is dripped under the same conditions, it becomes clear that the diffusion of the liquid varies depending on the groove processing. It can be confirmed that the circular grooves and spiral grooves have high slurry retention, while the radial grooves and arc grooves excel in slurry discharge. Thus, even with the same polishing pad, the diffusion of slurry differs due to groove processing, which affects the action of slurry intervening with the workpieces such as wafers. Therefore, the selection of groove processing is very important. Our company can assist you in selecting groove processing while considering your process conditions and targets, so please feel free to consult with us.
Slurry diffusion effect due to pad groove processing
Slurry diffusion effect due to pad groove processing
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IC1000(TM)画像.jpg

Foam Polyurethane Pad "IC1000(TM)"

The de facto standard for polishing pads in the CMP process. World market share No. 1!

There have been numerous successful adoptions to date, and we continue to maintain a high market share. The IC1000(TM) is designed based on special materials, manufacturing, and processing technologies, as well as advanced application evaluation techniques, ensuring optimal performance.

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EXTERION(TM)画像.jpg

Foam Polyurethane Pad "EXTERION(TM)"

Polishing pads optimal for primary polishing in mirror surface finishing.

The EXTERION(TM) series is a polyurethane foam pad created from advanced foam control technology. It is used for primary polishing of silicon wafers and compound substrates, providing a high-quality finish and reliable polishing performance. Additionally, its special processing technology demonstrates excellent thickness precision and startup performance.

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不織布パッド『SUBA』.JPG

Non-woven fabric pad "Suba(TM)"

A non-woven fabric-based polishing pad that responds well to various applications.

"Suba(TM)" is a polishing pad made from polyester fibers, with polyurethane impregnated into a non-woven fabric formed by a dry process. It demonstrates excellent performance primarily for primary and secondary polishing of silicon wafers, sapphire wafers, and oxide wafers. It can also be used for edge polishing and notch polishing, and offers a wide range of products tailored to each process. 【Features】 ■ High polishing rate ■ Low defect rate ■ High flatness *For more details, please refer to the catalog or feel free to contact us.

  • Wafer processing/polishing equipment
  • Hand polishing and filing
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H1000画像.png

Soft Pad "H1000"

Polishing pad for achieving defect-free finishes

The H1000 series pad was developed as a pad for final polishing of silicon wafers. Its unique resin design demonstrates excellent scratch performance, and the straight pore structure achieves high stability and long life.

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Related catalog(1)

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

Nitta Dupont Co., Ltd. "CMP Polishing Pad" Product Catalog

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Non-cloudy glass pot lid

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The glass pot lid has a hydrophilic heat-resistant coating, allowing you to check the cooking state without any fogging.

Aug 10, 2025

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Support for the commemorative day "The Day to End the Too Hot Summer" established by SPACECOOL and JCLP. August 8th serves as an opportunity to make climate change a personal issue—"We must not get used to this heat."

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SPACECOOL Co., Ltd. is pleased to announce its support for the purpose of the newly established memorial day "Day to End the Too Hot Summer" by the Japan Climate Leaders Partnership (JCLP). In order to address the increasingly severe heat waves, we will continue to promote the expansion of our zero-energy cooling radiative cooling material "SPACECOOL." JCLP has registered August 8, 2025, and every August 8 thereafter, as "Day to End the Too Hot Summer" with the Japan Anniversary Association. — What is the new memorial day "Day to End the Too Hot Summer"? In recent times, many regions in Japan have been experiencing consecutive days of extreme heat, and the impacts of climate change are manifesting in serious ways in our lives. Nevertheless, reports and discussions linking this to "climate change" are limited, and there is currently a lack of momentum for climate change measures. In response to this issue, JCLP has decided to establish the "Day to End the Too Hot Summer" during this hottest time of the year, creating a social impetus to reframe "heat" as a climate change issue. This memorial day aims to share the commitment to halt the climate crisis for future generations and serve as a starting point for advancing the systemic transformation of society as a whole.

Aug 08, 2025

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Truck berth vehicle detection

It's not too late to address the "Logistics 2024 Problem." Why not immediately reduce drivers' waiting times?

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Are you making progress on measures for the "2024 Problem"? With stricter management of drivers' working hours, reducing "waiting time" has become an urgent issue in the logistics field. To address this challenge, our company, Hotron, proposes the "Vehicle Detection Ultrasonic Sensor 'HM-UX2'," which instantly grasps the availability of loading bays. The 'HM-UX2' contributes to the resolution of waiting times by accurately understanding the availability situation, reducing unnecessary waiting and queueing, and shortening waiting times to alleviate the burden on drivers! By replacing the "eyes" of your loading bay management with this high-precision sensor, why not start addressing the "2024 Problem"? Take a look at the product features: "Can it accurately detect availability?" "Can we really use it in our company?" "I just want to know the cost, even if it's an estimate." If you have any questions or requests, please feel free to consult with us.

Aug 08, 2025

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Notice of additional compatible cameras for the Elua 7.6 series.

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The following cameras are supported in the Elua 7.6 series. Product introduction: https://aileunsys.co.jp/b01_aileun.html Compatible camera list: https://aileunsys.co.jp/aileun/compatible_camera.html Newly added: - Manufacturer: DAHUA Model number (1 model): DH-IPC-HFW2449TLN-S-PRO

Aug 08, 2025

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Notice of Summer Vacation

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Dear Valued Customers, Thank you very much for your continued support. We would like to inform you that our company will be closed for summer vacation from Wednesday, August 13, 2025, to Friday, August 15, 2025. We will resume normal operations on Monday, August 18. We appreciate your understanding and cooperation.

Aug 08, 2025

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