High-temperature annealing equipment in a vacuum or various gas atmospheres allows for rapid heating and clean heating through infrared heating.
- The outer circumference of the cylindrical vacuum chamber features a highly expandable vacuum chamber with eight vacuum ports. - The top is widely opened, making it easy to install and remove samples.
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basic information
Maximum heating rate: 150℃/sec, heating time: approximately 1 minute to 1500℃. Clean heating that does not affect the release gases from the heat source or electromagnetic induction. An option to observe high-temperature samples is also available.
Price information
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Delivery Time
※2.5 months
Applications/Examples of results
Sample annealing in vacuum/gas flow Thermal treatment of semiconductor samples such as silicon and SiC, and oxides Heating of graphene and CNT Temperature rise tests of ultra-high temperature materials such as high heat-resistant metals and ceramics Annealing in gas flows such as oxygen and hydrogen Wettability tests
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Company information
In 1982, we established our company with the theme of "Heat." Since then, we have been advancing the development and sales of heat treatment equipment for research and development, utilizing unique heat treatment technologies that are not found in other companies, which are essential for the research and development of new materials. In particular, our infrared heating device has gained significant attention as a "new heating method" for test samples in ultra-high vacuum systems, and it is widely used in universities of science and engineering across the country, independent administrative research institutes, private research and development departments, and overseas universities. Currently, we have delivered over 700 units of this device and more than 3,000 units of various heat treatment equipment in total.