LCD substrate high-pressure cleaning device
The adoption of a high-precision clean air knife system has achieved an optimal liquid drainage state without any remaining water droplets or stains. A variety of combinations of cleaning tools are possible.
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basic information
Efficient and high cleaning effects can be achieved with the high-speed spraying of micron-level microdroplets after chemical treatment, allowing for a reduction in line length. Other cleaning tools can also be equipped (ultrasonic dip, mega shower, alkaline, acid, functional water cleaning).
Price information
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Delivery Time
※3 to 4 months
Applications/Examples of results
Cleaning equipment for incoming materials, pre-coating cleaning equipment, pre-shipment cleaning equipment, cullet cleaning equipment, FPD cleaning equipment (liquid crystal, color filter, touch panel, organic EL, organic EL lighting systems), PDP, solar cells, automotive glass, and other glass substrate cleaning equipment.
Company information
◆Development, etching, stripping devices/cleaning devices for FPC ◆Development, etching, stripping devices/cleaning devices for COF ◆Development, etching, stripping devices/cleaning devices for FPD (TFT/PDP) ◆Cleaning devices for solar cells ◎Fine technology Fine results cannot be reproduced without a comprehensive design that combines nozzle arrangement, nozzle characteristics, oscillation, pressure adjustment, etc. ◎Thin plate transport technology Experience and proven results are essential for transporting thin plates without damage. The Ninomiya system has incorporated creativity and ingenuity to achieve reliable transport. ◎High reliability Devices designed to achieve a higher level can be used with confidence by our customers. The Ninomiya system does not compromise on device manufacturing.
![[Semiconductor/Class 100 Compatible] 100% Water-Free Air Nozzle](https://image.mono.ipros.com/public/product/image/2116982/IPROS15202438644694791694.png?w=280&h=280)