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  4. Cleaning machine
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  6. LCD substrate high-pressure cleaning device

LCD substrate high-pressure cleaning device

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last updated:Nov 18, 2009

二宮システム
二宮システム
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LCD substrate high-pressure cleaning device

The adoption of a high-precision clean air knife system has achieved an optimal liquid drainage state without any remaining water droplets or stains. A variety of combinations of cleaning tools are possible.

    Other processing machinesOther semiconductor manufacturing equipmentOther cleaning machines
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LCD substrate high-pressure cleaning device

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basic information

Efficient and high cleaning effects can be achieved with the high-speed spraying of micron-level microdroplets after chemical treatment, allowing for a reduction in line length. Other cleaning tools can also be equipped (ultrasonic dip, mega shower, alkaline, acid, functional water cleaning).

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-

Delivery Time

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※3 to 4 months

Applications/Examples of results

Cleaning equipment for incoming materials, pre-coating cleaning equipment, pre-shipment cleaning equipment, cullet cleaning equipment, FPD cleaning equipment (liquid crystal, color filter, touch panel, organic EL, organic EL lighting systems), PDP, solar cells, automotive glass, and other glass substrate cleaning equipment.

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二宮システム

二宮システム

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◆Development, etching, stripping devices/cleaning devices for FPC ◆Development, etching, stripping devices/cleaning devices for COF ◆Development, etching, stripping devices/cleaning devices for FPD (TFT/PDP) ◆Cleaning devices for solar cells ◎Fine technology Fine results cannot be reproduced without a comprehensive design that combines nozzle arrangement, nozzle characteristics, oscillation, pressure adjustment, etc. ◎Thin plate transport technology Experience and proven results are essential for transporting thin plates without damage. The Ninomiya system has incorporated creativity and ingenuity to achieve reliable transport. ◎High reliability Devices designed to achieve a higher level can be used with confidence by our customers. The Ninomiya system does not compromise on device manufacturing.

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