By using a dedicated chamber for rinsing and drying, precise cleaning is possible.
The cassette is set in the loader, and the substrate is transported using a chemical-resistant clean robot. Chemical processing is performed in Chamber A, rinsing in Chamber B, followed by spin drying, and then the substrate is stored in the cassette set in the unloader. This is a single-wafer automatic multi-spin processor.
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basic information
【Features】 ■Device Dimensions 2700W×1500D×2000H (200WCBT) 3000W×1500D×2000H (300WCBT) ■Work Size Wafer φ4″ to φ8″ (300CBT has a MAX of φ12″) Mask □4″ to □6″ (same MAX of □9″) ■Options Work Inversion Mechanism FOUP Load Port Compatibility Reticle Case Compatibility SMIF POD Compatibility Orifice/Notch Alignment Mechanism Ionizer Ozone Water Supply Unit High-Pressure Pump Unit Chemical Supply Unit Functional Water Supply Unit Excimer UV Unit Anti-Static Device □For more details, please refer to the catalog.
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Company information
Kanamex Co., Ltd. has been engaged in the design and manufacturing of wet processing equipment related to photolithography in the semiconductor industry since its establishment. In today's electronics industry, particularly in the semiconductor front-end, advanced packaging technology, and FPD fields, there is an increasing demand for manufacturing processes that accommodate thinner, larger, and more advanced device substrates, as well as devices with higher functionalities, which require innovative manufacturing equipment. To meet the needs of the industry, our company is always alongside our customers, striving to improve customer satisfaction, maintaining a constant research and development mindset, and building innovative technologies to provide products and services that align with industry demands. We aim to conduct vibrant corporate activities as part of our management philosophy and will continue to work towards contributing to the development of society.