NBD: Strain analysis of micro-regions using Nano Beam Diffraction.
The NBD method allows us to gain insights into lattice strain from the changes in the diffraction angle of the electron beam (positions of electron diffraction spots) within the sample. Measurements can be conducted in any arbitrary crystal axis incident direction, tailored to the device pattern. Results measured on the Si substrate in the element separation region (around LOCOS) confirmed that the strain varies depending on the heat treatment temperature and crystal orientation.
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Analysis of LSI and memory.
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