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  6. Reactive Process Gas Monitor Qulee RGM-202/302

Reactive Process Gas Monitor Qulee RGM-202/302

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last updated:Jan 27, 2016

アルバック/ULVAC, Inc.
アルバック/ULVAC, Inc.
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Process monitor with differential exhaust system compatible with reactive processes such as etching and CVD [ULVAC].

The Qulee RGM-202/RGM-302 is a process monitor equipped with a differential exhaust system that supports reactive processes such as etching and CVD in the Qulee series. Thanks to ULVAC's unique ion source and exhaust system structure, it offers excellent corrosion resistance to reactive gases and enables stable measurements over long periods. 【Specifications】 ○ Mass: Exhaust system: 57 kg / Control system: 38 kg ○ Power supply voltage: AC100V 15A ○ Compressed air: Dry N2: 0.4 to 0.7 MPa (φ6 quick connector) ○ One Click function: Yes / He/H2O/N2/O2/Any gas ○ PC interface: RS-232C/485 For more details, please contact us or download the catalog.

    Other measurement, recording and measuring instrumentsAnalytical Equipment and Devices
04m_rgm.jpg

Reactive Process Gas Monitor Qulee RGM-202/302

04m_rgm.jpg
04m_rgm.jpg
  • Related Link - http://www.ulvac.co.jp/products_j/components/proce…

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basic information

【Features】 ○ Long-term stable measurements possible during reactive processes ○ Adoption of a Claude ion source with a magnetic field ○ Soft ionization minimizes gas dissociation, preventing decomposition and adsorption due to thermal reactions in a highly sensitive ionization chamber ○ Compact flow control valve ○ Shortened distance from the process chamber to the ion source allows for rapid response decomposition ○ Measurement possible over a wide pressure range of 10-6 to 13 kPa (depending on orifice selection) ○ Measurement possible without a PC ○ One Click function (easy for anyone, no complex operations required) ○ High-temperature baking up to 120ºC possible when connecting the sensor unit ○ Incorporation of traceability functions for preventive maintenance analysis tubes of the ion source and secondary electron multiplier (patent pending) ○ Helium leak tests, air leak tests, and buildup tests possible ○ Software standardly included (compatible with Windows XP/7) ● For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Monitoring of reaction gases during processes ○ Endpoint monitoring for etching and cleaning processes ○ Residual gas measurement ○ Leak testing ● For more details, please contact us or download the catalog.

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Reactive Process Gas Monitor Qulee RGM-202/302

Reactive Process Gas Monitor Qulee RGM-202/302

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アルバック/ULVAC,

アルバック/ULVAC, Inc.

Electronic Components and Semiconductors

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ULVAC's corporate philosophy aims to contribute to the development of industry and science by comprehensively utilizing vacuum technology and its related technologies. ULVAC brings together its unique technologies cultivated through years of research and development and production technology reform to provide "ULVAC Solutions," which integrate equipment, materials, analytical evaluation, and services in a multifaceted manner for flat panel displays, electronic components, semiconductors, and general industrial equipment. Moving forward, we will continue to firmly embrace changes in the times and the needs of our customers, striving to be a top global manufacturer in all cutting-edge fields.

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