We will conduct non-contact and non-destructive inspections of dose amount monitoring after implantation and junction depth measurements before and after annealing treatment.
**Principle of the Device** ■ The Generation Laser generates excess minority carriers and heats areas where obvious damage exists. ■ The excess minority carrier gradient forms the refractive index gradient. ■ The Probe Laser utilizes the refractive index gradient or surface thermal information to measure junction depth, dose level, and PAI depth. ■ The Generation Laser is modulated at 2 kHz, achieving an excellent S/N ratio. ■ The long-wavelength Probe Laser does not heat the sample.
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basic information
■Non-contact, non-destructive measurement ●Monitoring of implant dose ●PAI depth measurement ●Junction depth measurement ■High sensitivity ■High reproducibility and reliable operation ■Fully automated and easy operation ■Compatible with 1 & 2 load ports and FOUP opener ■Standard equipped with Cognex pattern recognition system
Price information
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Applications/Examples of results
■Non-contact, non-destructive measurement ●Monitoring of implant dose ●PAI depth measurement ●Junction depth measurement
Company information
Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.
