FastGate Inline CV/IV Measurement Device
It is a device that can be used inline because it does not require electrode formation, does not damage the wafer, and leaves no contamination.
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basic information
USL (ultra-shallow layer <40nm) ion implantation, monitoring of low-dose ion implantation dose, electrical film thickness measurement of ultra-thin oxide films (<20Å), dielectric constant measurement of SiON films and High-k films, and resistivity measurement of Epi are possible. Main measurement and evaluation items: - Electrical film thickness (CET/EOT) - Flat band voltage (VFB) - Measurement of interface state density (Dit) - Leakage IV measurement - Monitoring of low-dose ion implantation amount for USJ (below 40nm) - Epi resistivity measurement
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Applications/Examples of results
USL (ultra shallow layer <40nm) ion implantation, monitoring of low dose ion implantation dosage, electrical film thickness measurement of ultra-thin oxide films (<20Å), dielectric constant measurement of SiON films and High-k films, and resistivity measurement of Epi are possible. Main measurement and evaluation items: - Electrical film thickness (CET/EOT) - Flat band voltage (VFB) - Measurement of interface state density (Dit) - Leakage IV measurement - Monitoring of low dose ion implantation amount for USJ (below 40nm) - Epi resistivity measurement
Company information
Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.