Ideal for organic EL substrate cleaning! Alkaline-compatible spin cleaning device.
This device manually sets the workpiece onto the main body, performs vacuum suction, and conducts two-liquid cleaning, ultrasonic cleaning, and N2 blow drying while spinning.
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basic information
Cleaning Work ● PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ● 8, 12-inch wafers compatible with various workpieces (optional) Cleaning Water ● Alkaline ● Pure water ● Hydrogen dissolved water ● Ozone water Supported Rotation Speed MAX 3000rpm Pure Water Supply Pressure 0.3Mpa or higher N2 Blow Drying N2 Blow Dry Dimensions External Dimensions W1180×D1350×H1610
Price information
This is a reference price. For details, please contact us.
Price range
P7
Delivery Time
※Four months after the order was received.
Applications/Examples of results
●PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ●8, 12-inch wafers compatible with various workpieces (optional)
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Company information
July 2009: Received certification for a research and development plan related to the advancement of manufacturing infrastructure technology for small and medium-sized enterprises from the Ministry of Economy, Trade and Industry. June 2010: Began joint development with the National Institute of Advanced Industrial Science and Technology on glass etching for solar cells. February 2011: Ordered and received an 8-inch chemical cleaning system for the 3D semiconductor research center. July 2011: Contracted by Saitama Prefecture for the next-generation industry entry support project. November 2011: Developed an alkaline spin etching system. Specifications: For large substrates (300 mm square). February 2012: Completion of the next-generation industry entry support project in Saitama Prefecture. April 2012: Newly developed silicon wafer separator for solar cells.