High-Performance Mask Aligner LA Series

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last updated：Sep 26, 2012

ナノテック

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Compact fine exposure standard machine. 4/6/8 inch standard mask aligner.

The high-performance mask aligner LA series is a standard device for compact fine exposure with 4/6/8 inch standard mask aligners. It is an exposure device capable of high-resolution pattern exposure in research fields requiring photolithography, such as semiconductor device fabrication. It is equipped with a specially designed dual-objective two-field CCD microscope, allowing alignment of small samples with a minimum objective lens spacing of 18mm. It features a wipe device for simultaneous two-field monitoring display, and the Z-axis is driven by air pressure with a gap fine adjustment lever. It supports hard contact, soft contact, and proximity exposure. The parallel mechanism employs reliable spherical bearings for compactness and high versatility. For more details, please contact us or refer to the catalog.

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【Features】 ○ Standard mask aligners for 4/6/8 inches ○ Compact standard machine for fine exposure ○ Exposure equipment capable of high-resolution pattern exposure → Suitable for research fields requiring photolithography, such as semiconductor device fabrication ○ Equipped with a specially designed dual-objective two-view CCD microscope ○ Minimum objective lens spacing of 18mm allows for alignment of small samples ○ Two-view simultaneous monitor display possible with wipe device ○ Z-axis driven by air pressure with gap fine adjustment lever ○ Compatible with hard contact, soft contact, and proximity exposure ○ Parallel mechanism employs reliable spherical bearings ○ Compact and highly versatile 【Product Lineup】 ○ φ4 Mask Aligner: LA410 ○ φ6 Mask Aligner: LA610 ○ φ8 Mask Aligner: LA810 ● For more details, please contact us or refer to the catalog.