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  6. Dry cleaning device "MDC8540L" for GaN film deposition equipment fixtures

Dry cleaning device "MDC8540L" for GaN film deposition equipment fixtures

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last updated:Apr 10, 2013

メープル
メープル
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【Free demo available!】 Achieve significant cost reduction with newly developed, high-performance design! It also reduces the burden on workers.

The "MDC8540L" is the flagship model of the MDC series, designed for cleaning fixtures used in the manufacturing of compound semiconductors such as power devices, blue laser diodes, and blue LEDs, employing a dry etching method to clean GaN, AlN, and other materials that accumulate during film deposition. It is ideal for improving product yield during mass production and reducing running costs. 【Features】 - Optimal for dry cleaning various fixtures used in GaN and AlN deposition equipment - Cleanable fixtures include SiC-coated carbon susceptors, quartz fixtures, etc. - Sapphire substrates of dummy wafers can also be cleaned - No need for wet cleaning or a large number of spare parts - Reduction in maintenance costs due to the introduction of this equipment - Safe design that does not burden operators ● For more details, please download the catalog or contact us.

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Dry cleaning device "MDC8540L" for GaN film deposition equipment fixtures

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The "MDC8540L" is the flagship model of the MDC series, designed for cleaning fixtures used in the manufacturing of compound semiconductors such as power devices, blue laser diodes, and blue LEDs, through a dry etching method that cleans GaN, AlN, and other materials deposited during film formation. It is ideal for improving product yield during mass production and reducing running costs. 【Features】 - Optimal for dry cleaning various fixtures used in GaN and AlN film deposition equipment - Cleanable fixtures include SiC coated carbon susceptors, quartz fixtures, etc. - Sapphire substrates for dummy wafers can also be cleaned - No need for wet cleaning or large quantities of spare parts - Reduction in maintenance costs due to the introduction of this equipment - Safe design that does not burden operators ● For more details, please download the catalog or contact us.

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Dry cleaning device for GaN film deposition equipment fixtures

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Dry cleaning device for GaN film formation equipment fixture MDC8540L

Dry cleaning device for GaN film formation equipment fixture MDC8540L

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Ferrous/Non-ferrous metals

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The name of the new organization, Maple Co., Ltd., which aims to achieve development through a new stage in the field of precision processing and assembly, embodies the fundamental policy of "organizations are people" that has been inherited from the past, as well as the concept of "people think, people create." Make People. "Creating people" along with "people create." This attitude embedded in our company name symbolizes the way we aspire to shape our organization and business in the future.

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