Dry cleaning device for GaN film deposition equipment fixtures 【Free demo available!】

Dry cleaning extends the life of jigs and reduces costs! Significant time savings compared to wet cleaning!

The dry cleaning device for GaN film deposition equipment is a system that cleans GaN and AlN deposited during the film formation process, such as on fixtures of MO-CVD equipment, using a dry etching method. It is ideal for the production of compound semiconductors like power devices and laser diodes, as well as blue LEDs. It effectively improves product yield during manufacturing and reduces running costs. 　　　★☆★【Free Demo】Now Available!!★☆★ 【Features】 ● Optimal for dry cleaning of various fixtures used in GaN film deposition equipment ● Cleanable fixtures include SiC coated carbon, quartz, etc. ● Dummy wafers with sapphire substrates can also be cleaned. ● No need for expensive large quantities of spare parts required for wet cleaning ● The introduction of this device can contribute to reducing maintenance costs! ● Safety design that does not burden the operator. ★If you would like a 【Free Demo】, please contact us through the ≪Inquiry≫ form★

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