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  6. Dry cleaning device for GaN film formation equipment fixtures

Dry cleaning device for GaN film formation equipment fixtures

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last updated:Oct 01, 2010

メープル
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Introduction to the dry cleaning device for GaN film deposition equipment fixtures.

Ideal for dry cleaning various jigs used in GaN film deposition equipment.

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Dry cleaning device for GaN film formation equipment fixtures

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【Features】 ● Ideal for dry cleaning various fixtures used in GaN film deposition equipment ● Cleanable fixtures include SiC coated carbon, quartz, etc. ● Sapphire substrates of dummy wafers can also be cleaned ● Eliminates the need for expensive and time-consuming wet cleaning and large quantities of spare parts ● Introduction of this equipment can contribute to reducing maintenance costs ● Safety design that does not burden the operator *For details, please contact us for materials request.

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Dry cleaning device for GaN film deposition equipment fixtures

Dry cleaning device for GaN film deposition equipment fixtures

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Dry cleaning device for GaN film formation equipment fixture MDC8540L

Dry cleaning device for GaN film formation equipment fixture MDC8540L

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メープル

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Ferrous/Non-ferrous metals

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The name of the new organization, Maple Co., Ltd., which aims to achieve development through a new stage in the field of precision processing and assembly, embodies the fundamental policy of "organizations are people" that has been inherited from the past, as well as the concept of "people think, people create." Make People. "Creating people" along with "people create." This attitude embedded in our company name symbolizes the way we aspire to shape our organization and business in the future.

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