Has numerous achievements in leading companies in Asia.
The plasma generation section and the processing section are completely separated. The processing is carried out using only radical components. ■ Processing Targets Modification of the target work surface (improvement of bonding strength, enhancement of adhesion) Removal of organic substances from the target work surface 【Features】 ■ Reduces damage to the processed film due to chemical processing using only radicals without electron or ion attacks ■ Ideal for processing conductive films and glass after electrode formation ■ Various reaction gases can be used: CDA (Clean Dry Air), N2, O2, Ar, etc. For more details, please contact us.
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For more details, please contact us at the information below. 【Contact Information】 Hitachi High-Tech Corporation Production System Sales Division, Sensor Device Solutions Department, Sakamoto TEL 080-6772-6387
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The corporate philosophy aims to be a company that is "trusted" by all stakeholders, and through business activities based on "value creation" using high-tech solutions, it contributes to the progress and development of society. Currently, we are engaged in global business development across five segments: "Electronic Device Systems," "Finetech Systems," "Scientific and Medical Systems," "Industrial and IT Systems," and "Advanced Industrial Materials." We will also organically integrate "trading company functions" and "manufacturing functions" to respond to our customers' needs as an advanced technology company.
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