It controls the output phase of multiple RF power sources consistently.
For one reference signal, it controls the load voltage phase of two RF power supplies and matching devices, allowing each phase to be controlled by selecting either open-loop (feedforward control) or closed-loop (feedback control). - Open-loop (feedforward control) The phase is measured and controlled on the RF power supply side. General phase shifters use this method. - Closed-loop (feedback control) The phase is measured and fed back from a location closer to the plasma, specifically at the output end of the matching device. Compared to conventional methods, this allows for more accurate phase control. Specifications: NXE-03B-2P AC Input: 85–240V 50/60Hz 50VA Reference Frequency: 13.56MHz ±0.005% Phase Control Range: 0–359° Phase Measurement Accuracy: ±5° across the entire phase range Input Dynamic Range: Minimum input level 3dBm, Maximum input level 23dBm
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basic information
For one reference signal, it controls the load voltage phase of two RF power supplies and matching networks, allowing each phase to be controlled by selecting either open-loop (feedforward control) or closed-loop (feedback control). - Open-loop (feedforward control) This measures and controls the phase on the RF power supply side. Typical phase shifters use this method. - Closed-loop (feedback control) This measures the phase at a location closer to the plasma, specifically at the output end of the matching network, and provides feedback. Compared to conventional methods, it allows for more accurate phase control. Specifications: NXE-03B-2P AC Input: 85–240V 50/60Hz 50VA Reference Frequency: 13.56MHz ±0.005% Phase Control Range: 0–359° Phase Measurement Accuracy: ±5° across the entire phase range Input Dynamic Range: Minimum input level 3dBm, Maximum input level 23dBm
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P3
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Applications/Examples of results
It controls the output phase of multiple RF power sources consistently.
Company information
RF Technologies has been involved in the development and design of high-frequency technologies since the time high-frequency power supplies began to be used in plasma processes, including "demonstration research," "material development," "surface modification," "semiconductor manufacturing," "FPD manufacturing," and "solar cells." Fortunately, we have had the opportunity for technical collaboration and exchange with academic researchers and major semiconductor manufacturing equipment manufacturers at the forefront of global technology. We have experienced many instances where the alignment of our technologies was essential to solving issues that overlap between areas that equipment manufacturers need to address and areas that power supply manufacturers need to resolve.
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