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  6. Experimental excimer UV irradiation device

Experimental excimer UV irradiation device

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last updated:Dec 12, 2016

ブルーオーシャンテクノロジー
ブルーオーシャンテクノロジー
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High-intensity 172nm excimer lamp, surface illuminance of 150mW/cm² or more.

**Features** - High brightness and high uniformity due to high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamps can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to a unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit & N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface, resulting in no obstruction of light and minimal transmission or reflection losses, leading to high efficiency. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. Ozone is generated efficiently, allowing for uniform control of oxygen concentration with a small amount. **Main Applications** - Surface modification for cleaning glass, films, and wafers - Bonding of films, glass, resins, metals, etc. - HDD cleaning, modification, and lubrication oil curing - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces **Examples of Equipment Installation** - Pre-cleaning equipment for G8 size TFT substrate film formation - Roll-to-roll cleaning equipment - Resist ashing equipment

    Coater
実験機画像2.jpg

Experimental excimer UV irradiation device

実験機画像2.jpg
実験機画像2.jpg

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basic information

**Features** - High brightness and high uniformity due to high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamp can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit and N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface, resulting in no obstruction of light and minimal transmission or reflection losses, leading to high efficiency. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. This allows for efficient ozone generation and uniform control of oxygen concentration with a small amount. **Main Applications** - Cleaning and surface modification of glass, film, and wafers - Bonding of films, glass, resins, metals, etc. - HDD cleaning, modification, and lubricant hardening - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces **Examples of Equipment Installation** - Pre-cleaning equipment for G8 size TFT substrate film formation - Roll-to-roll cleaning equipment - Resist ashing equipment

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Applications/Examples of results

**Features** - High brightness and high uniformity achieved through high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamp can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit & N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface, resulting in no obstruction of light and minimal transmission or reflection losses, leading to high efficiency. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. Ozone is generated efficiently, allowing for uniform control of oxygen concentration with a small amount. **Main Applications** - Surface modification for cleaning glass, films, and wafers - Bonding of films, glass, resins, metals, etc. - HDD cleaning, modification, and lubricant curing - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces **Examples of Equipment Installation** - Pre-cleaning equipment for G8 size TFT substrate film formation - Roll-to-roll cleaning equipment - Resist ashing equipment

Company information

ブルーオーシャンテクノロジー

ブルーオーシャンテクノロジー

Industrial Machinery

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We provide manufacturing equipment sales, proposals, and services unique to a "technical trading company" that has design know-how and contract/manufacturing partners. We have accumulated achievements through experiments and development with optimal selections tailored to our customers' needs. We will continuously develop new innovative technologies and applied technologies. We offer high-value-added proposals that encompass equipment sales, contract rental services, and consumable parts sales.

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