We will clean the vacuum chamber and the sample without damaging the sample and without contamination.
We will ensure the complete removal of contamination during sample observation using electron microscopes and vacuum chambers. There will be no damage or contamination to the samples. The intensity of the plasma can be monitored to automatically control parameters such as pressure.
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basic information
■Ignition of plasma at a low pressure of 0.1 mTorr. ■Plasma emission can be monitored. ■Automatic matching of RF impedance. ■Automatic control of gas flow rate is possible.
Price range
Delivery Time
Applications/Examples of results
Electron microscope SEM, FIB, TEM, EBL, CD-SEM, EBR, EUVL, ALD, and high-pressure chamber.
Detailed information
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Before cleaning Before using the plasma cleaner, it is contaminated with contamination.
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After cleaning This is a photo after cleaning with a plasma cleaner. Contamination has been completely removed.
Company information
Matsubo provides services in two business areas: [Industrial Machinery & Information] and [Powder Technology], supported by a [Technical Center] backup system. Breaking away from the confines of a specialized machinery trading company, we have established a comprehensive service system to ensure our customers can use our products with confidence, ranging from consulting prior to implementation, engineering related to installation and localization, to maintenance and proposals for improvements and modifications after installation.
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