Photoresist Development Speed Analysis Evaluation Device
The Resist Development Analyzer RDA series allows for rapid analysis of development characteristics such as measuring the development speed of photoresists, generating contrast curves, and calculating sensitivity. Additionally, it can accurately determine the resist modeling parameters required for lithography simulators.
Inquire About This Product
basic information
【Main Features】 ● High-speed development speed measurement function ● Development characteristic analysis function ● Parameter calculation function ● Parameter database function
Price range
Delivery Time
Applications/Examples of results
Please feel free to contact us for inquiries about development characteristics analysis.
Company information
Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
![[Data] Example of EPMA Analysis](https://image.mono.ipros.com/public/product/image/0ee/2000615141/IPROS17256860680284511002.png?w=280&h=280)
