Designed for high performance, high quality, and low cost.
The "4-inch front nano-sized pattern mold" is a Si substrate mold created using cutting-edge semiconductor processes. This product has been designed with the aim of achieving high performance, high quality, and low cost for mass production. Please choose from two types of full molds with 4-inch size holes and pillars according to your application. 【Features】 ■ High performance ■ High quality ■ Low cost *For more details, please refer to the catalog or feel free to contact us.
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basic information
【Lineup】 ■SCIVAX 220nm Pattern Hole Mold (SF-H220) ■SCIVAX 220nm Pattern Pillar Mold (SF-P220) *For more details, please refer to the catalog or feel free to contact us.
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For more details, please refer to the catalog or feel free to contact us.
Company information
To perform nano-sized microfabrication at a low cost, various technological elements such as equipment, optical design, molds, materials, nanoimprinting, etching, and inspection are essential. Our company has engineers from various fields and can provide the necessary technological elements required by our customers. We offer comprehensive support that goes above and beyond to meet the diverse needs of our customers, whether for optical applications or electronic applications. If you are considering microfabrication, especially nano wafer processing, please do not hesitate to contact us.
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